Attenuated phase-shift mask for line patterns in EUV lithography

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 10-16

  Sugawara, Minoru ^a   Chiba, Akira ^a   Yamanashi, Hiromasa ^a   Oizumi, Hiroaki ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Annular illumination; Attenuated phase shift mask; Line pattern; Printability; Resolution enhancement

Indexed keywords

COMPUTER SIMULATION; LOGIC DEVICES; MASKS; ULTRAVIOLET RADIATION;

LINE PATTERNS;

LITHOGRAPHY;

EID: 0038021013     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00055-8     Document Type: Conference Paper

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