메뉴 건너뛰기




Volumn 151, Issue 9, 2004, Pages

Dependence of hydrogen diffusion on the electric field in p-type silicon

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CAPACITANCE; DIFFUSION; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE; ELECTROCHEMISTRY; HYDROGEN; HYDROGENATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SEPARATION; THERMOANALYSIS;

EID: 5044224550     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1774490     Document Type: Article
Times cited : (12)

References (24)
  • 24
    • 0004223026 scopus 로고
    • Academic Press, Inc., London
    • Oxygen in Silicon, F. Shimura, Editor, Academic Press, Inc., London (1994).
    • (1994) Oxygen in Silicon
    • Shimura, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.