Magnetoresistance effect of planar-type ferromagnetic tunnel junctions

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Tomoda, Yusuke ^a   Shibata, Yoshio ^a   Shirakashi, Jun Ichi ^a   Takemura, Yasushi ^b  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTRIC RESISTANCE; ELECTRODES; ION BEAMS; LITHOGRAPHY; MAGNETIC FIELD EFFECTS; MAGNETORESISTANCE; NANOTECHNOLOGY; NICKEL COMPOUNDS; OXIDATION; TUNNEL JUNCTIONS;

DRAIN ELECTRODES; FERROMAGNETIC TUNNEL JUNCTIONS; NANOSCALE MAGNETORESISTIVE ELEMENTS; SCANNING PROBE MICROSCOPES;

FERROMAGNETIC MATERIALS;

EID: 33646737954     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2172575     Document Type: Article

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