Structural, electrical and optical properties of ITO films with a thin TiO2 seed layer prepared by RF magnetron sputtering

Vacuum

Volumn 83, Issue 8, 2009, Pages 1091-1094

  Song, Shumei ^a,b   Yang, Tianlin ^a   Li, Yanhui ^a   Pang, ZhiYong ^b   Lin, Liang ^b   Lv, Maoshui ^a   Han, Shenghao ^a,b  

^a SHANDONG UNIVERSITY   (China)

^b SHANDONG UNIVERSITY   (China)

Author keywords

ITO; Resistivity; TiO2 seed layer; Transmittance

Indexed keywords

ATOMIC FORCE MICROSCOPES; COATED GLASS SUBSTRATES; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL MEASUREMENTS; HIGH QUALITIES; ITO; ITO FILMS; OPTICAL TRANSMITTANCES; RESISTIVITY; RF- MAGNETRON SPUTTERING; SINGLE LAYERS; SUBSTRATE TEMPERATURES; TIN-DOPED INDIUM OXIDES; TIO2 SEED LAYER; TRANSMITTANCE; VISIBLE RANGES; X- RAY DIFFRACTIONS;

FILM PREPARATION; GLASS; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL PROPERTIES; OXIDE FILMS; SUBSTRATES; TIN; TITANIUM COMPOUNDS;

OPTICAL FILMS;

EID: 64449088366     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.01.003     Document Type: Article

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