The fabrication of ZnO/MgO multilayer films on Si (1 1 1) by PLD

Vacuum

Volumn 80, Issue 9, 2006, Pages 977-980

  Wang, Zhao yang ^a   Hu, Li zhong ^a   Zhao, Jie ^a   Zhang, He qiu ^a   Wang, Zhi jun ^a  

^a State Key Laboratory for Materials Modification by Laser   (China)

Author keywords

Pulse laser deposition; TEM; ZnO MgO multilayer

Indexed keywords

OXYGEN; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTAL PHASES; MULTILAYER FILMS; OXYGEN PRESSURE; ZNO/MGO MULTILAYER;

THIN FILMS;

EID: 33646872640     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.12.010     Document Type: Article

References (5)

1. Bhattacharya P., Das R.R., and Katiyar R.S. App Phys Lett 83 (2003) 2010-2012
2. Zhang B.P., Binh N.T., Wakatsuki K., et al. App Phys Lett 86 (2005) (032105-1-032105-3)
3. Choi J.H., Tabata H., and Kawai T. J Cryst Growth 226 (2001) 493-500
4. Wang Z.-y., Hu L.-z., Zhao J., et al. Vacuum 78 (2005) 53-57
5. Chen T., Min Li X., Zhang S., et al. J Cryst Growth 270 (2004) 553-559