Influences of reaction products on etch rates and linewidths in a poly-Si/oxide etching process using HBr/O2 based inductively coupled plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 2120-2125

  Miwa, K ^a   Mukai, T ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (SPECIFIC GRAVITY); ELECTRIC POWER SUPPLIES TO APPARATUS; ELECTRODES; EMISSION SPECTROSCOPY; HYDROGEN INORGANIC COMPOUNDS; INDUCTIVELY COUPLED PLASMA; OXYGEN; POLYSILICON; SILICA; SILICON WAFERS; SULFUR COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRITICAL DIMENSION SHIFTS; ETCH RATES; HYDROGEN BROMIDE; LINEWIDTHS; OPTICAL EMISSION SPECTROSCOPY; PLASMA CLEANING; SILICON SEASONING TIME;

PLASMA ETCHING;

EID: 0036026389     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1511216     Document Type: Article

References (30)

1. R. A. Gottscho, Abstracts of the 47th American Vacuum Society International Symposium, PS2-MoA9, Boston, 2000, p. 27.
2. V. M. Donnelly and N. Layadi, J. Vac. Sci. Technol. A 16, 1571 (1998).
3. J. A. O'Neill and J. Singh, J. Appl. Phys. 77, 497 (1995).
4. G. P. Kota, J. W. Coburn, and D. B. Graves, J. Appl. Phys. 85, 74 (1999).
5. S.-I. Chou, D. S. Baer, R. K. Hanson, W. Z. Collison, and T. Q. Ni, J. Vac. Sci. Technol. A 19, 477 (2001).
6. G. A. Hebner, M. G. Blain, T. W. Hamilton, C. A. Nichols, and R. L. Jarecki, J. Vac. Sci. Technol. A 17, 3172 (1999).
7. G. Bruno, P. Capezzuto, G. Cicala, and P. Manodoro, J. Vac. Sci. Technol. A 12, 690 (1994).
8. M. Shen and Y. Melaku, Proceedings of the Dry Process Symposium, Tokyo, 1997, p. 127.
9. K. Miwa, T. Takagaki, and T. Ishida, Extended Abstracts of the 60th Autumn Meeting of the Japan Society of Applied Physics and Related Societies, 3p-H-7, Kobe, 1999, Vol. 2, p. 622.
10. K. K. Singh, M. Crockett, and Y. Bhatnagar, Abstracts of the 192nd Meeting of the Electrochemical Society, Paris, 1997, 97-2, p. 1881.
11. M. Schaepkens, R. C. M. Bosch, T. E. F. M. Standaert, G. S. Oehrlein, and J. M. Cook, J. Vac. Sci. Technol. A 16, 2099 (1998).
12. S. Xu, Z. Sun, X. Qian, J. Holland, and D. Podlesnik, J. Vac. Sci. Technol. B 19, 166 (2001).
13. B. A. Cruden, M. V. V. S. Rao, S. P. Sharma, and M. Meyyappan, J. Vac. Sci. Technol. B 20, 353 (2002).
14. S. J. Ullal, A. R. Godfrey, E. Edelberg, L. Braly, V. Vahedi, and E. S. Aydil, J. Vac. Sci. Technol. A 20, 43 (2002).
15. K. Miwa, T. Mukai, and M. Nakaishi, Extended Abstracts of the 47th Spring Meeting of the Japan Society of Applied Physics, 28a-ZC-33, Tokyo, 2000, Vol. 2, p. 750.
16. K. Miwa, T. Mukai, and T. Ishida, Extended Abstracts of the 61st Autumn Meeting of the Japan Society of Applied Physics and Related Societies, 5a-ZF-4, Sapporo, 2000, Vol. 2, p. 635.
17. K. Miwa, T. Mukai, and M. Nakaishi, Abstracts of the 47th American Vacuum Society International Symposium. PS2-MoA4, Boston, 2000, p. 26.
18. K. Miwa, T. Mukai, and T. Ishida, Extended Abstracts of the 48th Spring Meeting of the Japan Society of Applied Physics, 30p-YE-11, Tokyo, 2001, Vol. 2, p. 776.
19. K. Miwa, Extended Abstracts of the 62nd Autumn Meeting of the Japan Society of Applied Physics and Related Societies, 13a-D-2, Aichi, 2001, Vol. 2, p. 565.
20. E. A. Edelberg, L. B. Braly, V. Vahedi, J. Daugherty, S. J. Ullal, A. R. Godfrey, E. S. Aydil, H. K. Chiu, and H. J. Tao, Abstracts of the 47th American Vacuum Society International Symposium, PS1 + MS-WeA7, Boston, 2000, p. 167.
21. R. A. Gottscho, C. W. Jurgensen, and D. J. Vitkavage, J. Vac. Sci. Technol. B 10, 2133 (1992).
22. K. Yoshida, K. Tokashiki, and H. Miyamoto, Proceedings of the Dry Process Symposium, Tokyo, 1998, p. 153.
23. F. H. Bell and O. Joubert, J. Vac. Sci. Technol. B 15, 88 (1997).
24. T. D. Bestwick and G. S. Oehrlein, J. Vac. Sci. Technol. A 8, 1696 (1990).
25. M. Ohkuni and M. Kubota, Proceedings of the Dry Process Symposium, Tokyo, 1995, p. 87.
26. M. Baloch, M. Moalem, W.-E. Wang, and A. V. Hamza, J. Vac. Sci. Technol. A 14, 229 (1996).
27. C. C. Cheng, K. V. Guinn, V. M. Donnelly, and I. P. Herman, J. Vac. Sci. Technol. A 12, 2630 (1994).
28. E. A. Edelberg, A. Perry, N. Benjamin, and E. S. Aydil, J. Vac. Sci. Technol. A 17, 506 (1999).
29. S. J. Ullal, H. Singh, V. Vahedi, and E. S. Aydil, J. Vac. Sci. Technol. A 20, 499 (2002).
30. G. P. Kota, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 17, 282 (1999).