Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)

Journal of Physics D: Applied Physics

Volumn 33, Issue 11, 2000, Pages 1303-1314

  Cartry, G ^a   Magne, L ^a   Cernogora, G ^b  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b LABORATOIRE DES SCIENCES DU CLIMAT ET DE L ENVIRONNEMENT   (France)

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURE PROPERTIES; MATHEMATICAL MODELS; OXYGEN; SILICA; SURFACES;

ATOMIC OXYGEN RECOMBINATION; ELEY-RIDEAL MECHANISMS; LANGMUIR-HINSHELWOOD MECHANISMS; SURFACE MIGRATION; SURFACE REACTION COEFFICIENT VALUES;

ATOMIC PHYSICS;

EID: 0033707574     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/33/11/309     Document Type: Article

References (27)

1. Normand F, Marec J, Leprince Ph and Granier A 1991 Surface treatment of polypropylene by oxygen microwave discharge Mater. Sci. Eng. A 139 103-9
2. 7-x films by molecular beam epitaxy with an activated oxygen source Appl. Phys. Lett. 53 2683-5
3. Seward W A and Jumper E J 1991 Model for oxygen recombination on silicon-dioxide surfaces J. Therm. 5 284-91
4. Linnett J W, Marsden F R S and Marsden D G H 1956 The kinetics of the recombination of oxygen atoms at a glass surface Proc. R. Soc. A 234 489-503
5. Brake M, Hinkle J, Asmussen J, Hawley M and Kerber R 1983 Dissociation and recombination of oxygen atoms produced in a microwave discharge Plasma Chem. Plasma Process. 3 63
6. Wrickamanayaka S, Hosokawa N and Hatanaka Y 1991 Variation of the recombination coefficient of atomic oxygen on Pyrex glass with applied RF power Japan. J. Appl. Phys. 30 2897-900
7. Magne L, Coitout H, Cernogora G and Gousset G 1993 Atomic oxygen recombination at the wall in a time afterglow J. Phys. III France 3 1871-89
8. 2 dc glow discharges: determination of the wall recombination probability J. Phys. D: Appl. Phys. 28 1856-68
9. Gousset G, Touzeau M, Vialle M and Ferreira C M 1989 Kinetic model of a dc oxygen glow discharge Plasma Chem. Plasma Process. 9 189-206
10. 2 discharges J. Phys. D: Appl. Phys. 29 1021-31
11. Greaves J C and Linnett J W 1959 Recombination of atoms at surfaces, Part 6 - Recombination of oxygen atoms on silica from 20 °C to 600 °C Trans. Faraday Soc. 55 1355-61
12. Dickens P G and Sutcliffe M B 1964 Recombination of oxygen atoms on oxide surfaces, Part 1 - Activation energies of recombination Trans. Faraday Soc. 60 1272-85
13. Kim Y C and Boudart M 1991 Recombination of O, N, and H atoms on silica: kinetics and mechanism Langmuir 7 2999-3005
14. Diamy A M, Legrand J C and Al Andari J 1997 Atomic oxygen titration in a dioxygen microwave plasma. Part 1: recombination on silica walls New J. Chem. 21 177-85
15. Cartry G, Magne L and Cernogora G 1999 Atomic oxygen recombination on fused silica: experimental evidence of the surface state influence J. Phys. D: Appl. Phys. 32 L53-L56
16. Nasuti F, Barbato M and Bruno C 1996 Material-dependent catalytic recombination modelling for hypersonic flows J. Therm. Heat Transf. 10 131-6
17. Deutschmann O, Riedel U and Warnatz J 1995 Modeling of nitrogen and oxygen recombination on partial catalytic surfaces J. Heat Transf. 117 495-501
18. Gordiets B F and Ferreira C M 1997 Self-consistent modelling of volume and surface processes in air plasma 32nd Therm. Conf. AIAA paper no AIAA-97-2504
19. 2 microwave discharge XXIII International Conf. on Phenomena in Ionised Gases (Toulouse, France) vol IV, ed M C Bordage and A Gleizes pp 160-61
20. Zvonicek V 1997 Study of the surface recombination of oxygen, nitrogen and hydrogen atoms PhD Thesis Masaryk University, Brno, Czech Republic
21. 2 PhD Thesis Lisbon University, Lisbon, Portugal (in Portuguese)
22. Cacciatore M, Rutigliano M and Billing G D 1999 Eley-Rideal and Langmuir-Hinshelwood recombination coefficients for oxygen on silica surfaces J. Therm. Heat Transf. 13 195-203
23. Bond G C 1987 Heterogeneous Catalysis Principles and Applications 2nd edn (Oxford: Clarendon)
24. 2 PhD Thesis Paris Sud University, France (in French)
25. Barrer R M Br 1954 J. Appl. Phys. suppl. 3 41, 49
26. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
27. Talsky A and Zvonicek V 1996 The influence of impurities and wall temperature on N atom wall recombination XIII European Sectional Conf. on the Atomic and Molecular Physics of Ionised Gases (Poprad, Slovakia) vol B, ed Lukac, Kosinar, Skalny and Bratislava pp 325-6