Etching of polysilicon in inductively coupled Cl2 and HBr discharges: III. Photoresist mask faceting, sidewall deposition, and microtrenching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 3, 2002, Pages 1077-1083

  Mahorowala, Arpan P ^a   Sawin, Herbert H ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; COMPUTER SIMULATION; DEPOSITION; INDUCTIVELY COUPLED PLASMA; IONS; MONTE CARLO METHODS; PLASMA ETCHING; POLYSILICON; PROBABILITY; SURFACE PHENOMENA;

MICROTRENCHING;

PHOTORESISTS;

EID: 0035998536     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1481868     Document Type: Conference Paper

References (12)