SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 47, Issue 10 PART 1, 2008, Pages 8120-8123

Smooth and narrow nanopillars fabricated by ion-beam-induced deposition under charging conditions

(3) Chen, Ping a Salemink, Huub W M a Alkemade, Paul F A a

a DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

Charging effect; Gas molecule aggregation; Ion beam induced deposition; Secondary electrons

Indexed keywords

ATOMS; ION BEAMS; IONS; LEAKAGE (FLUID); MOLECULES; PLANTS (BOTANY); PLATINUM; SECONDARY EMISSION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON; SILICON WAFERS; SUPERCONDUCTING MATERIALS;

CHARGING CONDITIONS; CHARGING EFFECT; GAS MOLECULE AGGREGATION; ION-BEAM-INDUCED DEPOSITION; NANOPILLARS; SECONDARY ELECTRON EMISSIONS; SECONDARY ELECTRONS; SI WAFERS;

ELECTROMAGNETIC INDUCTION;

EID: 62249185202 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.8120 Document Type: Article

Times cited : (4)

References (36)

1
- 33748273924
- J. Igaki, K. Kanda, Y. Haruyama, M. Ishida, Y. Ochiai, J. Fujita, T. Kaito, and S. Matsui: Microelectron. Eng. 83 (2006) 1225.
- (2006) Microelectron. Eng , vol.83 , pp. 1225
- Igaki, J.¹ Kanda, K.² Haruyama, Y.³ Ishida, M.⁴ Ochiai, Y.⁵ Fujita, J.⁶ Kaito, T.⁷ Matsui, S.⁸

2
- 31844444168
- S. Okada, T. Mukawa, R. Kobayashi, J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui: Jpn. J. Appl. Phys. 44 (2005) 5646.
- (2005) Jpn. J. Appl. Phys , vol.44 , pp. 5646
- Okada, S.¹ Mukawa, T.² Kobayashi, R.³ Fujita, J.⁴ Ishida, M.⁵ Ichihashi, T.⁶ Ochiai, Y.⁷ Kaito, T.⁸ Matsui, S.⁹

3
- 33745662599
- S. Okada, T. Mukawa, R. Kobayashi, M. Ishida, Y. Ochiai, T. Kaito, S. Matsui, and J. Fujita: Jpn. J. Appl. Phys. 45 (2006) 5556.
- (2006) Jpn. J. Appl. Phys , vol.45 , pp. 5556
- Okada, S.¹ Mukawa, T.² Kobayashi, R.³ Ishida, M.⁴ Ochiai, Y.⁵ Kaito, T.⁶ Matsui, S.⁷ Fujita, J.⁸

4
- 0034314737
- S. Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda, and Y. Haruyama: J. Vac. Sci. Technol. B 18 (2000) 3181.
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3181
- Matsui, S.¹ Kaito, T.² Fujita, J.³ Komuro, M.⁴ Kanda, K.⁵ Haruyama, Y.⁶

5
- 0141876605
- G. M. Shedd, H. Lezec, A. D. Dubner, and J. Melngailis: Appl. Phys. Lett. 49 (1986) 1584.
- (1986) Appl. Phys. Lett , vol.49 , pp. 1584
- Shedd, G.M.¹ Lezec, H.² Dubner, A.D.³ Melngailis, J.⁴

6
- 55049111174
- P. Chen, P. F. A. Alkemade, and H. W. M. Salemink: Jpn. J. Appl. Phys. 47 (2008) 5123.
- (2008) Jpn. J. Appl. Phys , vol.47 , pp. 5123
- Chen, P.¹ Alkemade, P.F.A.² Salemink, H.W.M.³

7
- 0009346732
- A. D. Dubner and A. Wagner: J. Vac. Sci. Technol. B 7 (1989) 1950.
- (1989) J. Vac. Sci. Technol. B , vol.7 , pp. 1950
- Dubner, A.D.¹ Wagner, A.²

8
- 0001049827
- A. D. Dubner, A. Wagner, J. Melngailis, and C. V. Thompson: J. Appl. Phys. 70 (1991) 665.
- (1991) J. Appl. Phys , vol.70 , pp. 665
- Dubner, A.D.¹ Wagner, A.² Melngailis, J.³ Thompson, C.V.⁴

9
- 0003056169
- J. S. Ro, C. V. Thompson, and J. Melngailis: J. Vac. Sci. Technol. B 12 (1994) 73.
- (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 73
- Ro, J.S.¹ Thompson, C.V.² Melngailis, J.³

10
- 62249200243
- presented at, Japan
- R. Shuman, G. Sundaram, H. J. Lezec, and J. Bromley-Barratt: presented at 12th Int. Microprocesses and Nanotechnology Conf., 1999, Japan.
- (1999) 12th Int. Microprocesses and Nanotechnology Conf
- Shuman, R.¹ Sundaram, G.² Lezec, H.J.³ Bromley-Barratt, J.⁴

11
- 0036614013
- J. Fujita, M. Ishida, T. Ichihashi, T. Sakamoto, Y. Ochiai, T. Kaito, and S. Matsui: Jpn. J. Appl. Phys. 41 (2002) 4423.
- (2002) Jpn. J. Appl. Phys , vol.41 , pp. 4423
- Fujita, J.¹ Ishida, M.² Ichihashi, T.³ Sakamoto, T.⁴ Ochiai, Y.⁵ Kaito, T.⁶ Matsui, S.⁷

12
- 0036883153
- J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui: J. Vac. Sci. Technol. B 20 (2002) 2686.
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 2686
- Fujita, J.¹ Ishida, M.² Ichihashi, T.³ Ochiai, Y.⁴ Kaito, T.⁵ Matsui, S.⁶

13
- 0942289203
- J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui: J. Vac. Sci. Technol. B 21 (2003) 2990.
- (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 2990
- Fujita, J.¹ Ishida, M.² Ichihashi, T.³ Ochiai, Y.⁴ Kaito, T.⁵ Matsui, S.⁶

14
- 0029310065
- M. Weber, H. W. P. Koops, M. Rudolph, J. Kretz, and G. Schmidt: J. Vac. Sci. Technol. B 13 (1995) 1364.
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 1364
- Weber, M.¹ Koops, H.W.P.² Rudolph, M.³ Kretz, J.⁴ Schmidt, G.⁵

15
- 0036648348
- Y. M. Lau, P. C. Chee, J. T. L. Thong, and V. Ng: J. Vac. Sci. Technol. A 20 (2002) 1295.
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 1295
- Lau, Y.M.¹ Chee, P.C.² Thong, J.T.L.³ Ng, V.⁴

16
- 2542499189
- I. Utke, T. Bret, D. Laub, P. A. Buffat, L. Scandella, and P. Hoffmann: Microelectron. Eng. 73-74 (2004) 553.
- (2004) Microelectron. Eng , vol.73-74 , pp. 553
- Utke, I.¹ Bret, T.² Laub, D.³ Buffat, P.A.⁴ Scandella, L.⁵ Hoffmann, P.⁶

17
- 20444468507
- I. Utke, J. Michler, P. Gasser, C. Santschi, D. Laub, M. Cantoni, P. A. Buffat, C. Jiao, and P. Hoffmann: Adv. Eng. Mater. 7 (2005) 323.
- (2005) Adv. Eng. Mater , vol.7 , pp. 323
- Utke, I.¹ Michler, J.² Gasser, P.³ Santschi, C.⁴ Laub, D.⁵ Cantoni, M.⁶ Buffat, P.A.⁷ Jiao, C.⁸ Hoffmann, P.⁹

18
- 79956037527
- I. Utke, A. Luisier, P. Hoffmann, D. Laub, and P. A. Buffat: Appl. Phys. Lett. 81 (2002) 3245.
- (2002) Appl. Phys. Lett , vol.81 , pp. 3245
- Utke, I.¹ Luisier, A.² Hoffmann, P.³ Laub, D.⁴ Buffat, P.A.⁵

19
- 33646047144
- T. Bret, I. Utke, P. Hoffmann, M. Abourida, and P. Doppelt: Microelectron. Eng. 83 (2006) 1482.
- (2006) Microelectron. Eng , vol.83 , pp. 1482
- Bret, T.¹ Utke, I.² Hoffmann, P.³ Abourida, M.⁴ Doppelt, P.⁵

20
- 0942267547
- M. Ishida, J. Fujita, T. Ichihashi, and Y. Ochiai: J. Vac. Sci. Technol. B 21 (2003) 2728.
- (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 2728
- Ishida, M.¹ Fujita, J.² Ichihashi, T.³ Ochiai, Y.⁴

21
- 33745647869
- K. Mitsuishi, M. Shimojo, M. Takeguchi, M. Tanaka, and K. Furuya: Jpn. J. Appl. Phys. 45 (2006) 5517.
- (2006) Jpn. J. Appl. Phys , vol.45 , pp. 5517
- Mitsuishi, K.¹ Shimojo, M.² Takeguchi, M.³ Tanaka, M.⁴ Furuya, K.⁵

22
- 0003698310
- Wiley, New York, Chap. 1
- R. G. Wilson, F. A. Stevie, and C. W. Magee: Secondary Ion Mass Spectrometry (Wiley, New York, 1989) Chap. 1.
- (1989) Secondary Ion Mass Spectrometry
- Wilson, R.G.¹ Stevie, F.A.² Magee, C.W.³

23
- 0004266743
- Heinemann Educational, London, Chap. 3
- G. Carter and J. S. Colligon: Ion Bombardment of Solids (Heinemann Educational, London, 1968) Chap. 3.
- (1968) Ion Bombardment of Solids
- Carter, G.¹ Colligon, J.S.²

24
- 0141483968
- Kluwer Academic/Plenum, New York, Chap. 4
- J. Orloff, M. Utlaut, and L. Swanson: High Resolution Focused Ion Beams: FIB and Its Applications (Kluwer Academic/Plenum, New York, 2003) Chap. 4.
- (2003) High Resolution Focused Ion Beams: FIB and Its Applications
- Orloff, J.¹ Utlaut, M.² Swanson, L.³

25
- 62249186419
- See ref. 23, Chap. 4
- See ref. 23, Chap. 4.

26
- 0025206302
- B. A. Brusilovsky: Appl. Phys. A 50 (1990) 111.
- (1990) Appl. Phys. A , vol.50 , pp. 111
- Brusilovsky, B.A.¹

27
- 0001146286
- R. A. Baragiola: Nucl. Instrum. Methods Phys. Res., Sect. B 78 (1993) 223.
- (1993) Nucl. Instrum. Methods Phys. Res., Sect. B , vol.78 , pp. 223
- Baragiola, R.A.¹

28
- 0016559359
- L. A. Dietze and J. C. Sheffied: J. Appl. Phys. 46 (1975) 4361.
- (1975) J. Appl. Phys , vol.46 , pp. 4361
- Dietze, L.A.¹ Sheffied, J.C.²

29
- 0033521394
- K. Wittmaack: Surf. Sci. 419 (1999) 249.
- (1999) Surf. Sci , vol.419 , pp. 249
- Wittmaack, K.¹

30
- 0040716977
- K. Wittmaack: Nucl. Instrum. Methods Phys. Res., Sect. B 58 (1991) 317.
- (1991) Nucl. Instrum. Methods Phys. Res., Sect. B , vol.58 , pp. 317
- Wittmaack, K.¹

31
- 0030564413
- K. Wittmaack: Nucl. Instrum. Methods Phys. Res., Sect. B 115 (1996) 288.
- (1996) Nucl. Instrum. Methods Phys. Res., Sect. B , vol.115 , pp. 288
- Wittmaack, K.¹

32
- 0000764359
- F. Banhart: Phys. Rev. E 52 (1995) 5156.
- (1995) Phys. Rev. E , vol.52 , pp. 5156
- Banhart, F.¹

33
- 0001704647
- J.-Z. Zhang, X.-Y. Ye, X.-J. Yang, and D. Liu: Phys. Rev. E 55 (1997) 5796.
- (1997) Phys. Rev. E , vol.55 , pp. 5796
- Zhang, J.-Z.¹ Ye, X.-Y.² Yang, X.-J.³ Liu, D.⁴

34
- 0035979428
- H. Z. Wang, X. H. Liu, X. J. Yang, and X. Wang: Mater. Sci. Eng. A 311 (2001) 180.
- (2001) Mater. Sci. Eng. A , vol.311 , pp. 180
- Wang, H.Z.¹ Liu, X.H.² Yang, X.J.³ Wang, X.⁴

35
- 18544386094
- M. Song, K. Mitsuishi, M. Tanaka, M. Takeguchi, M. Shimojo, and K. Furuya: Appl. Phys. A 80 (2005) 1431.
- (2005) Appl. Phys. A , vol.80 , pp. 1431
- Song, M.¹ Mitsuishi, K.² Tanaka, M.³ Takeguchi, M.⁴ Shimojo, M.⁵ Furuya, K.⁶

36
- 31844433672
- G. Xie, M. Song, K. Mitsuishi, and K. Furuya: Jpn. J. Appl. Phys. 44 (2005) 5654.
- (2005) Jpn. J. Appl. Phys , vol.44 , pp. 5654
- Xie, G.¹ Song, M.² Mitsuishi, K.³ Furuya, K.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.