The complex mechanisms of ion-beam-induced deposition

Japanese Journal of Applied Physics

Volumn 47, Issue 6 PART 2, 2008, Pages 5123-5126

  Chen, Ping ^a   Alkemade, Paul F A ^a   Salemink, Huub W M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Ion beam induced deposition; Primary ions; Secondary atoms; Secondary electrons; Secondary particles

Indexed keywords

ATOMIC PHYSICS; ATOMS; BEAM PLASMA INTERACTIONS; DEPOSITION; ELECTROLYSIS; ELECTROMAGNETIC WAVES; ION BEAMS; ION BOMBARDMENT; SECONDARY EMISSION; SPUTTERING; SUPERCONDUCTING MATERIALS;

ANGULAR DEPENDENCES; ATOM EMISSIONS; COMPLEX MECHANISMS; DWELL TIMES; IN-SITU; INDUCED DEPOSITIONS; PRIMARY IONS; SECONDARY ATOMS; SECONDARY ELECTRONS; SECONDARY PARTICLES; SPUTTERING YIELDS;

IONS;

EID: 55049111174     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.5123     Document Type: Article

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