Electron resist behavior of pd hexadecanethiolate examined using x-ray photoelectron spectroscopy with nanometric lateral resolution

Langmuir

Volumn 25, Issue 2, 2009, Pages 1259-1264

  Bhuvana, T ^a   Gregoratti, Luca ^b   Heun, Stefan ^c   Dalmiglio, Matteo ^b   Kulkarni, G U ^a  

^a JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

^b SINCROTRONE TRIESTE   (Italy)

^c INFM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRON SPECTROSCOPY; ELECTRONS; INFRARED SPECTROSCOPY; PALLADIUM; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS;

ALKYL CHAINS; DIRECT WRITE; E-BEAM RESISTS; ELECTRON RESISTS; ELECTRON-BEAM EXPOSURES; HIGHLY SENSITIVES; LATERAL RESOLUTIONS; NANOMETRIC; PD NANOPARTICLES; THIOLATE; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 61849104512     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803344f     Document Type: Article

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