Direct writing of ZrO2 on a sub-10 nm scale using an electron beam

Nanotechnology

Volumn 15, Issue 1, 2004, Pages 158-162

  Subramanian, K R V ^a   Saifullah, M S M ^a   Tapley, E ^b   Kang, Dae Joon ^a   Welland, M E ^a   Butler, M ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Leica Microsystems Lithography Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; ELECTRON BEAMS; ETHANOL; PHOTORESISTS; SPUTTERING; STABILITY; ZIRCONIA;

BENZOYL ACETONE; DIRECT WRITING; ELECTRON BEAM PATTERNING; ZIRCONIUM BUTOXIDE;

NANOTECHNOLOGY;

EID: 0742321686     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/1/031     Document Type: Article

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