Nanostructure fabrication by direct electron-beam writing of nanoparticles

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2768-2772

  Griffith, Saul ^a   Mondol, Mark ^b   Kong, David S ^a   Jacobson, Joseph M ^a  

^a MIT MEDIA LAB   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER CONTROL; ELECTRON BEAM LITHOGRAPHY; GOLD; MULTILAYERS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SILVER; SINTERING; THIN FILMS;

DIRECT ELECTRON BEAM WRITING; NANOPARTICLES; NANOSTRUCTURE FABRICATION;

NANOSTRUCTURED MATERIALS;

EID: 0036874819     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526697     Document Type: Article

References (8)

1. D. R. Smith et al., Phys. Rev. Lett. 84, 4184 (2000).
2. L. Clarke et al., Appl. Phys. Lett. 71, 617 (1997).
3. P. Hoffman, G. B. Assayag, J. Gierak, J. Flicstein, M. Maar-Stumm, and H. Van Den Bergh, J. Appl. Phys. 74, 7588 (1993).
4. G. J. Berry, J. A. Cairns, and J. Thomson, J. Mater. Sci. Lett. 14, 844 (1995).
5. T. R. Bedson, P. D. Nellist, R. E. Palmer, and J. P. Wolcoxon (unpublished).
6. M. T. Reetz, M. Winter, G. Dumpich, J. Lohau, and S. Friedrichowski, J. Am. Chem. Soc. 119, 4539 (1997).
7. K. Wilder, H. T. Soh, A. Atalar, and C. F. Quate, J. Vac. Sci. Technol. B 15, 1811 (1997).
8. K. Wilder, C. F. Quate, B. Singh, and D. F. Kyser, J. Vac. Sci. Technol. B 16, 3864 (1998).