Sub-10 nm high-aspect-ratio patterning of ZnO using an electron beam

Advanced Materials

Volumn 17, Issue 14, 2005, Pages 1757-1761

  Saifullah, Mohammad S M ^a   Subramanian, Kavasseri R V ^a   Kang, Dae Joon ^a,b   Anderson, David ^c   Huck, Wilhelm T S ^a   Jones, Geraint A C ^c   Welland, Mark E ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Sungkyunkwan University   (South Korea)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; ELECTRONIC EQUIPMENT; ELECTROPHORESIS; NANOTECHNOLOGY; OPTICAL DEVICES; OPTIMIZATION; SINGLE CRYSTALS; SOL-GELS;

CALIXERENES; ELECTROCHEMICAL GROWTH; ULTRASONIC SPRAY-ASSISTED CHEMICAL VAPOR DEPOSITION; ZINC NAPHTHENATE RESIST;

ZINC OXIDE;

EID: 23044509108     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200500484     Document Type: Article

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