Chemical and structural properties of atomic layer deposited La2 O3 films capped with a thin Al2 O3 layer

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages

  Li, X L ^a   Tsoutsou, D ^a   Scarel, G ^a   Wiemer, C ^a   Capelli, S C ^a,b   Volkos, S N ^a   Lamagna, L ^a   Fanciulli, M ^a,c  

^a LABORATORIO MDM   (Italy)

^b INSTITUT LAUE LANGEVIN   (France)

^c UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 61449255372     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3079632     Document Type: Letter

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