Structure and mechanical properties of δ-NbN/SiNx and δ′-NbN/SiNx nano-multilayer films deposited by reactive magnetron sputtering

Surface and Coatings Technology

Volumn 203, Issue 12, 2009, Pages 1702-1708

  Wen, M ^a,b   Meng, Q N ^a,b   Hu, C Q ^a,b   An, T ^a,b   Su, Y D ^a,b   Yu, W X ^a,b   Zheng, W T ^b  

^a MOE   (China)

^b JILIN UNIVERSITY   (China)

Author keywords

B Nano indentation; C Physical vapour deposition; D Multilayer; X D NbN SiNx; X D NbN SiNx

Indexed keywords

DIFFRACTION; HARDNESS; MAGNETIC FILMS; MAGNETRONS; MECHANICAL PROPERTIES; MULTILAYERS; NANOINDENTATION; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

[B] NANO-INDENTATION; [C] PHYSICAL VAPOUR DEPOSITION; [D] MULTILAYER; CRITICAL FACTORS; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPES; LAYER THICKNESS; MAXIMUM HARDNESS; NANO-INDENTATION MEASUREMENTS; NANO-MULTILAYER FILMS; REACTIVE MAGNETRON SPUTTERING; SINGLE-LAYER FILMS; X- RAY DIFFRACTIONS;

MULTILAYER FILMS;

EID: 59849100874     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.01.002     Document Type: Article

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