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Volumn 311, Issue 3, 2009, Pages 698-701

Ab initio-based approach to structural change of compound semiconductor surfaces during MBE growth

Author keywords

A1. Phase diagrams; A1. Surface structure; A3. Molecular beam epitaxy; B1. Gallium compounds; B1. Nitrides; B1. Semiconducting III V materials

Indexed keywords

ADATOMS; ADSORPTION; ARSENIC; CLARIFICATION; CRYSTAL GROWTH; DESORPTION; GALLIUM ALLOYS; GALLIUM COMPOUNDS; GALLIUM NITRIDE; GRAPHIC METHODS; GROWTH (MATERIALS); MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; NITRIDES; PHASE DIAGRAMS; PROBABILITY DENSITY FUNCTION; SEMICONDUCTING GALLIUM; SEMICONDUCTOR QUANTUM WIRES; SULFUR COMPOUNDS; SURFACE ACTIVE AGENTS; SURFACE STRUCTURE; SURFACES;

EID: 59749085937     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.09.088     Document Type: Article
Times cited : (22)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.