Surface modification layer deposition on flexible substrates by plasma-enhanced chemical vapour deposition using tetramethylsilane-oxygen gas mixture

Journal of Physics D: Applied Physics

Volumn 41, Issue 22, 2008, Pages

  Wu, Cheng Yang ^a   Chen, Wen Cheng ^a   Liu, Day Shan ^a  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CHEMICAL PROPERTIES; ELECTRIC DISCHARGES; FUNCTIONAL ELECTRIC STIMULATION; GAS MIXTURES; GASES; GLOW DISCHARGES; HARD COATINGS; HARDNESS; HYDROCARBONS; ION BOMBARDMENT; IONS; MIXTURES; NONMETALS; OPTICAL PROPERTIES; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON COMPOUNDS; SUBSTRATES; SURFACE PROPERTIES; WATER VAPOR;

ATOMIC RATIOS; CHEMICAL VAPOUR DEPOSITIONS; DEPOSITED FILMS; FLEXIBLE PLASTIC SUBSTRATES; FLEXIBLE SUBSTRATES; HIGH PACKING DENSITIES; LOW WATERS; MECHANICAL HARDNESSES; OPTICAL-; OXYGEN GAS MIXTURES; PLASTIC SUBSTRATES; SURFACE MODIFICATIONS; SURFACE UNIFORMITIES; SURFACE WETTABILITIES; TETRAMETHYL SILANES; TRANSMISSION RATES; WATER VAPOURS;

GAS PERMEABLE MEMBRANES;

EID: 58149289995     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/22/225305     Document Type: Article

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