A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system

Materials Science Forum

Volumn 505-507, Issue PART 1, 2006, Pages 439-444

  Liu, Day Shan ^a   Liao, Yu Ko ^a   Wu, Cheng Yang ^a   Juang, Fuh Shyang ^a   Lee, Ching Ting ^b  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Flexible substrate; Hard coating; PECVD; Silicon oxide; Tertramethylsilane

Indexed keywords

EVAPORATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILICA; SUBSTRATES;

FLEXIBLE SUBSTRATE; HARD COATING; SILICON OXIDE; TERTRAMETHYLSILANE;

METALLIC FILMS;

EID: 35348844615     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-990-3.439     Document Type: Conference Paper

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