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Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 45-49

Characteristics of ultra water-repellent thin films prepared by combined process of microwave plasma-enhanced CVD and oxygen-plasma treatment

(7) Wu, Yunying a,b Inoue, Yasushi a Sugimura, Hiroyuki a Takai, Osamu a Kato, Hirohisa c Murai, Sachio c Oda, Hirofumi c

a NAGOYA UNIVERSITY (Japan)

b AICHI SCIENCE AND TECHNOLOGY FOUNDATION (Japan)

c Itoh Optical Industrial Co Ltd (Japan)

Author keywords

Mechanical properties; Optical properties; Oxygen plasma treatment; Plasma enhanced CVD; Ultra water repellency

Indexed keywords

HARDNESS; MICROWAVES; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAW MATERIALS; WATER; WEAR RESISTANCE;

OXYGEN-PLASMA TREATMENT; ULTRA WATER-REPELLENCY;

THIN FILMS;

EID: 0037155422 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00010-X Document Type: Conference Paper

Times cited : (21)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.