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Volumn 43, Issue 4, 2007, Pages 235-237

Optical nonlinearity of oxygen-rich SiOx thin films

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; EVAPORATION; SILICON COMPOUNDS; STOICHIOMETRY; THIN FILMS;

EID: 33847154602     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20073668     Document Type: Article
Times cited : (5)

References (6)
  • 1
    • 0035358682 scopus 로고    scopus 로고
    • Theoretical study for thermal/electric field polling of fused silica
    • 0021-4922
    • Liu, X.M., and Zhang, M.D.: ' Theoretical study for thermal/electric field polling of fused silica ', Jpn. J. Appl. Phys., 2001, 40, (6A), p. 4069-4076 0021-4922
    • (2001) Jpn. J. Appl. Phys. , vol.40 , Issue.6 A , pp. 4069-4076
    • Liu, X.M.1    Zhang, M.D.2
  • 2
    • 2342489498 scopus 로고    scopus 로고
    • Second-order optical nonlinearity and change in refractive index in silica glasses by a combination of thermal poling and x-ray irradiation
    • 10.1063/1.1652239 0021-8979
    • Kameyama, A., Yokotani, A., and Kurosawa, K.: ' Second-order optical nonlinearity and change in refractive index in silica glasses by a combination of thermal poling and x-ray irradiation ', J. Appl. Phys., 2004, 95, (8), p. 4000-4003 10.1063/1.1652239 0021-8979
    • (2004) J. Appl. Phys. , vol.95 , Issue.8 , pp. 4000-4003
    • Kameyama, A.1    Yokotani, A.2    Kurosawa, K.3
  • 5
    • 0004415141 scopus 로고
    • 2
    • 10.1063/1.336187 0021-8979
    • 2 ', J. Appl. Phys., 1985, 58, (2), p. 716-719 10.1063/1.336187 0021-8979
    • (1985) J. Appl. Phys. , vol.58 , Issue.2 , pp. 716-719
    • Devine, R.A.B.1
  • 6
    • 35949018486 scopus 로고
    • 2
    • 10.1103/PhysRevB.26.6649
    • 2 ', Phys. Rev. B, 1982, 26, (12), p. 6649-6659 10.1103/PhysRevB.26.6649
    • (1982) Phys. Rev. B , vol.26 , Issue.12 , pp. 6649-6659
    • Edwards, A.H.1    Fowler, W.B.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.