Preparation of silicon oxide films having a water-repellent layer by multiple-step microwave plasma-enhanced chemical vapor deposition

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 54-59

  Hozumi, Atsushi ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Fluroalkylsilane; Plasma CVD; Silicon oxide; Water repellency

Indexed keywords

FILM PREPARATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS;

FLUOROALKYLSILANE; SILICON OXIDE FILMS;

PROTECTIVE COATINGS;

EID: 0032483893     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01116-X     Document Type: Article

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