Nanoscale chemical effect on friction force

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 11, 2008, Pages 5839-5845

  Hsieh, Shuchen ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

AFM; Friction; FTIR; Nanolithography; SAM

Indexed keywords

AFM; ALKYLSILANE MONOLAYERS; APPLIED LOADS; ATOMIC FORCE MICROSCOPES; CARBOXYL GROUPS; CHEMICAL EFFECTS; CHEMICAL PATTERNS; COEFFICIENT OF FRICTIONS; CONSECUTIVE SCANS; DIRECT MEASUREMENTS; FILM-FORMING; FRICTION FORCE MEASUREMENTS; FRICTION FORCES; FTIR; LOCAL OXIDATIONS; METHYL GROUPS; NANOSCALE; OXIDATION PROCESSES; REDUCE FRICTIONS; SAM; SIGNIFICANT FACTORS; SILICON SUBSTRATES; SILICON SURFACES; SMALL AREAS; TERMINAL GROUPS; TIP VELOCITIES; TOPOGRAPHY EFFECTS;

ACOUSTIC MICROSCOPES; ATOMIC FORCE MICROSCOPY; ENGINEERING GEOLOGY; FORCE MEASUREMENT; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL GROUPS; HYDROCARBONS; MONOLAYERS; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OXIDATION; PORT TERMINALS; REDOX REACTIONS; SELF ASSEMBLED MONOLAYERS; SILANES; SURFACE TOPOGRAPHY; TRIBOLOGY;

FRICTION;

NANOMATERIAL; SILANE DERIVATIVE; SILICON;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; CONFORMATION; CRYSTALLIZATION; FRICTION; MACROMOLECULE; MATERIALS TESTING; MECHANICAL STRESS; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

COMPUTER SIMULATION; CRYSTALLIZATION; FRICTION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MODELS, CHEMICAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SILANES; SILICON; STRESS, MECHANICAL; SURFACE PROPERTIES;

EID: 58149236540     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.259     Document Type: Article

References (34)

1. S. Kramer, R. R. Fuierer, and C. B. Gorman, Chem. Rev. 103, 4367 (2003).
2. S. Lee, J. Kim, W. S. Shin, H.-J. Lee, S. Koo, and H. Lee, Mater. Sci. Eng. C 24, 3 (2004).
3. X. N. Xie, Mater. Sci. Eng. R 54, 1 (2006).
4. R. Garcia, R. V. Martinez, and J. Martinez, Chem. Soc. Rev. 35, 29 (2006).
5. L. Santinacci, T. Djenizian, and P. Schmuki, Appl. Phys. Lett. 79, 1882 (2001).
6. M. Muller, T. Fiedler, R. Groger, T. Koch, S. Walheim, C. Obermair, and T. Schimmel, Surf. Interface. Anal. 36, 189 (2004).
7. P. Avouris, T. Hertel, and R. Martel, Appl. Phys. Lett. 71, 285 (1997).
8. J. A. Dagata, Appl. Phys. Lett. 73, 271 (1998).
9. A. Orians, C. B. Clemons, D. Golovaty, and G. W. Young, Surf. Sci. 600, 3297 (2006).
10. R. Maoz, E. Frydman, S. R. Cohen, and J. Sagiv, Adv. Mater. 12, 725 (2000).
11. H. Sugimura, T. Hanji, K. Hayashi, and O. Takai, Ultramicroscopy 91, 221 (2002).
12. M. Ara, H. Graaf, and H. Tada, Appl. Phys. Lett. 80, 2565 (2002).
13. M. Yang, Z. Zheng, Y. Liu, and B. Zhang, Nanotechnology 17, 330 (2006).
14. A. Checco, Y. Cai, O. Gang, and B. M. Ocko, Ultramicroscopy 106, 703 (2006).
15. A. Checco, O. Gang, and B. M. Ocko, Phys. Rev. Lett. 96, 056104 (2006).
16. M. Johannes, D. G. Cole, and R. L. Clark, Appl. Phys. Lett. 90, 103106 (2007).
17. D. Wouters, R. Willems, S. Hoeppener, C. F. J. Flipse, and U. S. Schubert, Adv. Fund. Mater. 15, 938 (2005).
18. R. V. Martinez, F. Garcia, R. Garcia, E. Coronado, A. Forment-Aliaga, F. M. Romero, and S. Tatay, Adv. Mater. 19, 291 (2007).
19. C. F. Chen, S. D. Tzeng, M. H. Lin, and S. Gwo, Langmuir 18, 7819 (2006).
20. J. Gu, C. M. Yam, S. Li, and C. Cai, J. Am. Chem. Soc. 126, 8098 (2004).
21. S. W. Chung, D. S. Ginger, M. W. Morales, Z. F. Zhang, V. Chandrasekhar, M. A. Ratner, and C. A. Mirkin, Small 1, 64 (2005).
22. J. Davis, C. B. Bagshaw, K. L. Busuttil, Y. Hanyu, and K. S. Coleman, J. Am. Chem. Soc. 128, 14135 (2006).
23. A. Checco, Langmuir 22, 116 (2006).
24. K. S. L. Chong, S. Sun, and G. J. Leggett, Langmuir 21, 3903 (2005).
25. J. L. Hutter and J. Bechhoefer, Rev. Sci. Instrum. 64, 1868 (1993).
26. R. Proksch, T. E. Schäffer, J. P. Cleveland, R. C. Callahan, and M. B. Viani, Nanotechnology 15, 1344 (2004).
27. S. Sambasivan, S. Hsieh, D. Fischer, and S. M. Hsu, JVSTA 124, 1484 (2006).
28. K. Nakanishi and P. Solomon, Infrared Absorption Spectroscopy, Holden-Day, Inc., San Francisco (1977), pp. 20-45.
29. D. G. Kurth, Langmuir 9, 2965 (1993).
30. T. Balgar, R. Bautista, N. Hartmann, and E. Hasselbrink, Surf. Sci. 532-535, 963 (2003).
31. K. Bierbaum, M. Grunze, A. A. Baski, L. Chi, W. Schrepp, and H. Fuchs, Langmuir 11, 2143 (1995).
32. J. Gao, W. D. Luedtke, D. Gourdon, M. Ruths, J. N. Israelachvili, and U. Landman, J. Phys. Chem. B 108, 3410 (2004).
33. A. Noy, C. D. Frisbie, L. F. Rozsnyai, M. S. Wrighton, and C. M. Lieber, J. Am. Chem. Soc. 117, 7943 (1995).
34. M. Ruths, Langmuir 19, 6788 (2003).