Surface modification of an organosilane self-assembled monolayer on silicon substrates using atomic force microscopy: Scanning probe electrochemistry toward nanolithography

Ultramicroscopy

Volumn 91, Issue 1-4, 2002, Pages 221-226

  Sugimura, Hiroyuki ^a   Hanji, Takayuki ^a   Hayashi, Kazuyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Nanolithography; Organosilane self assembled monolayer; Scanning probe microscope

Indexed keywords

ADSORPTION; ELECTROCHEMISTRY; NANOTECHNOLOGY; SELF ASSEMBLY; SILANES; SILICON; SUBSTRATES; SURFACE TREATMENT;

SCANNING PROBE MICROSCOPY;

ATOMIC FORCE MICROSCOPY;

SILANE DERIVATIVE; SILICON; WATER;

ADSORPTION; AIR; ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; MICROSCOPE; SCANNING PROBE MICROSCOPY; SURFACE PROPERTY; VACUUM;

EID: 0036324217     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00102-X     Document Type: Article

References (28)