Nanoscale wettability of self-assembled monolayers investigated by noncontact atomic force microscopy

Langmuir

Volumn 22, Issue 1, 2006, Pages 116-126

  Checco, Antonio ^a,d   Schollmeyer, Hauke ^b,e   Daillant, Jean ^b   Guenoun, Patrick ^b   Boukherroub, Rabah ^c  

^a SERVICE DE PHYSIQUE DE L ETAT CONDENSÉ   (France)

^b CEA SACLAY   (France)

^c INSTITUT D ELECTRONIQUE   (France)

^d BROOKHAVEN NATIONAL LABORATORY   (United States)

^e UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLTRICHLOROSILANES; HYDROGEN-TERMINATED SILICON; NANOMETER SIZED DROPLETS; NANOSCALE WETTABILITY;

ATOMIC FORCE MICROSCOPY; MOLECULES; NANOSTRUCTURED MATERIALS; ORGANIC MINERALS; PERTURBATION TECHNIQUES; SUBSTRATES; WETTING;

SELF ASSEMBLY;

EID: 30344440835     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la051419b     Document Type: Article

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