-
1
-
-
0023592578
-
Generation of interface States by ionizing radiation at 80K measured by charge pumping and subthreshold slope techniques
-
N. S. Saks and M. G. Ancona, "Generation of interface States by ionizing radiation at 80K measured by charge pumping and subthreshold slope techniques," IEEE Trans Nucl. Sci., vol. 34, pp. 1348-1354, 1987.
-
(1987)
IEEE Trans Nucl. Sci
, vol.34
, pp. 1348-1354
-
-
Saks, N.S.1
Ancona, M.G.2
-
2
-
-
33846301124
-
Switching oxide ionizing radiation effects on ultra-thin oxide MOS structures
-
R. D. Schrimpf and D. M. Fleetwood, Eds. New Jersey: World Sci
-
A. Cester and A. Paccagnella, "Switching oxide ionizing radiation effects on ultra-thin oxide MOS structures," in Radiation Effects and Soft Errors in Integrated Circuits and Electronic Devices, R. D. Schrimpf and D. M. Fleetwood, Eds. New Jersey: World Sci., 2004.
-
(2004)
Radiation Effects and Soft Errors in Integrated Circuits and Electronic Devices
-
-
Cester, A.1
Paccagnella, A.2
-
3
-
-
33846289564
-
Total-ionizing-dose effects in modern CMOS technologies
-
H. J. Barnaby, "Total-ionizing-dose effects in modern CMOS technologies," IEEE Trans Nucl. Sci., vol. 53, pp. 3103-3121, 2006.
-
(2006)
IEEE Trans Nucl. Sci
, vol.53
, pp. 3103-3121
-
-
Barnaby, H.J.1
-
4
-
-
37249043765
-
Optimizing Radiation Hard by Design SRAM Cells
-
L. T. Clark, K. C. Mohr, K. E. Holbert, X. Yao, J. Knudsen, and H. Shah, "Optimizing Radiation Hard by Design SRAM Cells," IEEE Trans Nucl. Sci., vol. 54, pp. 2028-2036, 2007.
-
(2007)
IEEE Trans Nucl. Sci
, vol.54
, pp. 2028-2036
-
-
Clark, L.T.1
Mohr, K.C.2
Holbert, K.E.3
Yao, X.4
Knudsen, J.5
Shah, H.6
-
5
-
-
57849110328
-
DARPA rad-hard-by-design program results
-
San Diego, CA
-
W. Snapp, "DARPA rad-hard-by-design program results," in GOMAC Tech 2006. San Diego, CA, 2006.
-
(2006)
GOMAC Tech 2006
-
-
Snapp, W.1
-
6
-
-
0030349737
-
Two-Dimensional Simulation of Total Dose Effects on NMOSFET with Lateral. Parasitic Transistor
-
C. Brisset, V. F. Cavrois, O. Musseau, J. L. Leray, J. L. Pelloie, R. Escoffer, A. Michez, C. Cirba, and G. Bordure, "Two-Dimensional Simulation of Total Dose Effects on NMOSFET with Lateral. Parasitic Transistor," IEEE Trans. Nucl. Sci., vol. 43, pp. 2651-2658, 1996.
-
(1996)
IEEE Trans. Nucl. Sci
, vol.43
, pp. 2651-2658
-
-
Brisset, C.1
Cavrois, V.F.2
Musseau, O.3
Leray, J.L.4
Pelloie, J.L.5
Escoffer, R.6
Michez, A.7
Cirba, C.8
Bordure, G.9
-
7
-
-
33144468202
-
Two-dimensional methodology for modeling radiation-induced off-state leakage in CMOS technologies
-
I. S. Esqueda, H. J. Bamaby, and M. L. Alles, "Two-dimensional methodology for modeling radiation-induced off-state leakage in CMOS technologies," IEEE Trans. Nucl. Sci., vol. 52, pp. 2259-2264, 2005.
-
(2005)
IEEE Trans. Nucl. Sci
, vol.52
, pp. 2259-2264
-
-
Esqueda, I.S.1
Bamaby, H.J.2
Alles, M.L.3
-
8
-
-
0032318033
-
Challenges in Hardening Technologies Using Shallow-Trench Isolation
-
M. R. Shaneyfelt, P. E. Dodd, B. L. Draper, and R. S. Flores, "Challenges in Hardening Technologies Using Shallow-Trench Isolation," IEEE Trans Nucl. Sci., vol. 45, pp. 2584-2592, 1998.
-
(1998)
IEEE Trans Nucl. Sci
, vol.45
, pp. 2584-2592
-
-
Shaneyfelt, M.R.1
Dodd, P.E.2
Draper, B.L.3
Flores, R.S.4
-
9
-
-
0021594460
-
Analysis of damage in MOS devices in several radiation environments
-
T. R. Oldham, "Analysis of damage in MOS devices in several radiation environments," IEEE Trans. Nucl. Sci., vol. 31, pp. 1236-1241, 1984.
-
(1984)
IEEE Trans. Nucl. Sci
, vol.31
, pp. 1236-1241
-
-
Oldham, T.R.1
-
11
-
-
0003429510
-
Basic mechanisms of radiation effects in electronic materials and devices,
-
F. B. McLean and T. R. Oldham, "Basic mechanisms of radiation effects in electronic materials and devices," Harry Diamond Laboratories Technical Report, vol. HDL-TR, pp. 2129, 1987.
-
(1987)
Harry Diamond Laboratories Technical Report
, vol.HDL-TR
, pp. 2129
-
-
McLean, F.B.1
Oldham, T.R.2
-
12
-
-
0026384497
-
Charge yield for cobalt-60 and 10-keV x-ray irradiations
-
M. R. Shaneyfelt, D. M. Fleetwood, J. R. Schwank, and K. L. Hughes, "Charge yield for cobalt-60 and 10-keV x-ray irradiations," IEEE Trans. Nucl. Sci., vol. 38, pp. 1187-1194, 1991.
-
(1991)
IEEE Trans. Nucl. Sci
, vol.38
, pp. 1187-1194
-
-
Shaneyfelt, M.R.1
Fleetwood, D.M.2
Schwank, J.R.3
Hughes, K.L.4
-
14
-
-
0034450823
-
Total dose effects in composite nitride-oxide films
-
S. Lee, A. Raparia, Y. F. Li, G. Gasiot, R. D. Schrimpf, D. M. Fleetwood, K. F. Galloway, M. Featherby, and D. Johnson, "Total dose effects in composite nitride-oxide films," IEEE Trans Nucl. Sci., vol. 47, pp. 2297-2304, 2000.
-
(2000)
IEEE Trans Nucl. Sci
, vol.47
, pp. 2297-2304
-
-
Lee, S.1
Raparia, A.2
Li, Y.F.3
Gasiot, G.4
Schrimpf, R.D.5
Fleetwood, D.M.6
Galloway, K.F.7
Featherby, M.8
Johnson, D.9
-
15
-
-
0031342837
-
2
-
2," IEEE Trans Nucl. Sci., vol. 44, pp. 1799-1803, 1997.
-
(1997)
IEEE Trans Nucl. Sci
, vol.44
, pp. 1799-1803
-
-
Chavez, J.R.1
Karna, S.P.2
Vanheusden, K.3
Brothers, C.P.4
Pugh, R.D.5
Singaraju, B.K.6
Warren, W.L.7
Devine, R.A.B.8
-
16
-
-
0036953138
-
Unified model of hole trapping, 1/f noise, and thermally stimulated current in MOS devices
-
D. M. Fleetwood, H. D. Xiong, Z. Y. Lu, C. J. Nicklaw, J. A. Felix, D. Schrimpf, and S. T. Pantelides, "Unified model of hole trapping, 1/f noise, and thermally stimulated current in MOS devices," IEEE Trans Nucl. Sci., vol, 49, pp. 2674-2683, 2002.
-
(2002)
IEEE Trans Nucl. Sci
, vol.49
, pp. 2674-2683
-
-
Fleetwood, D.M.1
Xiong, H.D.2
Lu, Z.Y.3
Nicklaw, C.J.4
Felix, J.A.5
Schrimpf, D.6
Pantelides, S.T.7
-
17
-
-
0034450489
-
Electronic structure theory and mechanisms of the oxide trapped hole annealing process
-
S. P. Kama, A. C Pineda, R. D. Pugh, W. M. Shedd, and T. R. Oldham, "Electronic structure theory and mechanisms of the oxide trapped hole annealing process," IEEE Trans Nucl. Sci., vol. 47, pp. 2316-2321, 2000.
-
(2000)
IEEE Trans Nucl. Sci
, vol.47
, pp. 2316-2321
-
-
Kama, S.P.1
Pineda, A.C.2
Pugh, R.D.3
Shedd, W.M.4
Oldham, T.R.5
-
18
-
-
0036952441
-
The structure, properties, and dynamics of oxygen vacancies in amorphous SiO2
-
C J. Nicklaw, Z. Y. Lu, D. M. Fleetwood, R. D. Schrimpf, and S. T. Pantelides, "The structure, properties, and dynamics of oxygen vacancies in amorphous SiO2," IEEE Trans Nucl. Sci., vol. 49, pp. 2667-2673, 2002.
-
(2002)
IEEE Trans Nucl. Sci
, vol.49
, pp. 2667-2673
-
-
Nicklaw, C.J.1
Lu, Z.Y.2
Fleetwood, D.M.3
Schrimpf, R.D.4
Pantelides, S.T.5
-
19
-
-
0034451168
-
2 interfaces
-
2 interfaces," IEEE Trans Nucl. Sci., vol. 47, pp. 2262-2268, 2000.
-
(2000)
IEEE Trans Nucl. Sci
, vol.47
, pp. 2262-2268
-
-
Pantelides, S.T.1
Rashkeev, S.N.2
Buczko, R.3
Fleetwood, D.M.4
Schrimpf, R.D.5
-
20
-
-
0000789191
-
2
-
2," Phys. Rev. B, Condens. Matter, vol. 35, pp. 8223-8230, 1987.
-
(1987)
Phys. Rev. B, Condens. Matter
, vol.35
, pp. 8223-8230
-
-
Rudra, J.K.1
Fowler, W.B.2
-
21
-
-
37249086740
-
Mechanisms of enhanced radiation-induced degradation due to excess molecular hydrogen in bipolar oxides
-
X. J. Chen, H. J. Barnaby, B. Venueire, K. Holbert, D. Wright, R. L. Pease, R. D. Platteter, G. Dunham, J. Seiler, S. McClure, and P. Adell, "Mechanisms of enhanced radiation-induced degradation due to excess molecular hydrogen in bipolar oxides," IEEE Trans Nucl. Sci., vol. 54, pp. 1913-1919, 2007.
-
(2007)
IEEE Trans Nucl. Sci
, vol.54
, pp. 1913-1919
-
-
Chen, X.J.1
Barnaby, H.J.2
Venueire, B.3
Holbert, K.4
Wright, D.5
Pease, R.L.6
Platteter, R.D.7
Dunham, G.8
Seiler, J.9
McClure, S.10
Adell, P.11
-
22
-
-
0023531269
-
The role of hydrogen in radiationinduced defect formation in polysilicon gate MOS devices
-
J. R. Schwank, D. M. Fleetwood, P. S. Winokur, P. V. Dressendorfer, D. C Turpin, and D. T. Sanders, "The role of hydrogen in radiationinduced defect formation in polysilicon gate MOS devices.," IEEE Trans Nucl., Sci., vol. 34, pp. 1152-1158, 1987.
-
(1987)
IEEE Trans Nucl., Sci
, vol.34
, pp. 1152-1158
-
-
Schwank, J.R.1
Fleetwood, D.M.2
Winokur, P.S.3
Dressendorfer, P.V.4
Turpin, D.C.5
Sanders, D.T.6
-
23
-
-
0036947655
-
Physical model for enhanced interface-trap formation at low dose rates
-
S. N. Rashkeev, C. R. Cirba, D. M. Fleetwood, R. D. Schrimpf, S. C. Witczak, A. Michez, and S. T. Pantelides, "Physical model for enhanced interface-trap formation at low dose rates," IEEE Trans Nucl. Sci., vol. 49, pp. 2650-2655, 2002.
-
(2002)
IEEE Trans Nucl. Sci
, vol.49
, pp. 2650-2655
-
-
Rashkeev, S.N.1
Cirba, C.R.2
Fleetwood, D.M.3
Schrimpf, R.D.4
Witczak, S.C.5
Michez, A.6
Pantelides, S.T.7
-
24
-
-
31944438685
-
Common origin for enhanced low-dose-rate sensitivity and bias temperature instability under negative bias
-
L. Tsetseris, R. D. Schrimpf, D. M. Fleetwood, R. L. Pease, and S. T. Pantelides, "Common origin for enhanced low-dose-rate sensitivity and bias temperature instability under negative bias," IEEE Trans Nucl. Sci., vol. 52, pp. 2265-2271, 2005.
-
(2005)
IEEE Trans Nucl. Sci
, vol.52
, pp. 2265-2271
-
-
Tsetseris, L.1
Schrimpf, R.D.2
Fleetwood, D.M.3
Pease, R.L.4
Pantelides, S.T.5
-
25
-
-
33846267655
-
Physical model for the low-dose-rate effects in bipolar devices
-
J. Boch, F. Saigné, R. D. Schrimpf, J.-R. Vaille, L. Dusseau, and E. Lorfèvre, "Physical model for the low-dose-rate effects in bipolar devices," IEEE Trans Nucl. Sci., vol. 53, pp. 3655-3660, 2006.
-
(2006)
IEEE Trans Nucl. Sci
, vol.53
, pp. 3655-3660
-
-
Boch, J.1
Saigné, F.2
Schrimpf, R.D.3
Vaille, J.-R.4
Dusseau, L.5
Lorfèvre, E.6
-
26
-
-
0028547704
-
1/f noise and radiation effects in MOS devices
-
D. M. Fleetwood, T. L. Meisenheimer, and J. H. Scofield, "1/f noise and radiation effects in MOS devices," IEEE Trans. on Electron Devices, vol. 41, pp. 1953-1964, 1994.
-
(1994)
IEEE Trans. on Electron Devices
, vol.41
, pp. 1953-1964
-
-
Fleetwood, D.M.1
Meisenheimer, T.L.2
Scofield, J.H.3
-
27
-
-
57849167761
-
-
R. C Lacoe, J. V. Osbom, R. Koga, S. Brown, and J. Gambles, Total dose tolerance of the commercial TSMC 0.35uiu CMOS process, 2001 IEEE Radiation Effects Data Workshop, IEEE cat no. 01TH8588, pp. 72-77, 2001.
-
R. C Lacoe, J. V. Osbom, R. Koga, S. Brown, and J. Gambles, "Total dose tolerance of the commercial TSMC 0.35uiu CMOS process," 2001 IEEE Radiation Effects Data Workshop, vol. IEEE cat no. 01TH8588, pp. 72-77, 2001.
-
-
-
-
28
-
-
11044238201
-
-
S. N. Rashkeev, D. M. Fleetwood, R. D. Schrimpf, and S. T. Pantelides, Effects of hydrogen motion on interface trap formation and annealing, IEEE Trans Nucl. Sci., 51, pp. 3158-3.165, 2004.
-
S. N. Rashkeev, D. M. Fleetwood, R. D. Schrimpf, and S. T. Pantelides, "Effects of hydrogen motion on interface trap formation and annealing," IEEE Trans Nucl. Sci., vol. 51, pp. 3158-3.165, 2004.
-
-
-
-
29
-
-
0036540124
-
Effects of hydrogen transport and reactions on microelectronics radiation response and reliability
-
D. M. Fleetwood, "Effects of hydrogen transport and reactions on microelectronics radiation response and reliability," Microelectronics Reliability, vol. 42, pp. 523-541, 2002.
-
(2002)
Microelectronics Reliability
, vol.42
, pp. 523-541
-
-
Fleetwood, D.M.1
-
30
-
-
0032271790
-
-
S. Matsuda, T. Sato, H. Yoshimura, Y. Takegawa, A. Sudo, I. Mizushima, Y. Tsunashima, and Y. Toyoshima, Novel corner rounding rrocess for shallow trench isolation utilizing MSTS (Micro-Structure Transformation of Silicon), International Electron Devices Meeting, IEDM '98 Technical Digest, pp. 6.2.1-6.2.4, 1998.
-
S. Matsuda, T. Sato, H. Yoshimura, Y. Takegawa, A. Sudo, I. Mizushima, Y. Tsunashima, and Y. Toyoshima, "Novel corner rounding rrocess for shallow trench isolation utilizing MSTS (Micro-Structure Transformation of Silicon)," International Electron Devices Meeting, IEDM '98 Technical Digest, pp. 6.2.1-6.2.4, 1998.
-
-
-
-
31
-
-
0033337691
-
Sources of volatile gases hazardous to hermetic electronic enclosures
-
R. K. Lowry, "Sources of volatile gases hazardous to hermetic electronic enclosures," Ieee Trans. Elec. Packaging Man., vol. 22, pp. 319-323, 1999.
-
(1999)
Ieee Trans. Elec. Packaging Man
, vol.22
, pp. 319-323
-
-
Lowry, R.K.1
-
32
-
-
0024169724
-
Total dose hardness of MOS devices in hermetic ceramic packages
-
R. A. Kohler, R. A. Kushner, and K. H. Lee, "Total dose hardness of MOS devices in hermetic ceramic packages," IEEE Trans Nucl. Sci., vol. 35, pp. 1492, 1988.
-
(1988)
IEEE Trans Nucl. Sci
, vol.35
, pp. 1492
-
-
Kohler, R.A.1
Kushner, R.A.2
Lee, K.H.3
-
33
-
-
0036252578
-
Accuracy of approximations in MOSFET charge models
-
C. C. McAndrew and J. J. Victory, "Accuracy of approximations in MOSFET charge models," IEEE Trans. Electron Devices, vol. 49, pp. 72-81, 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, pp. 72-81
-
-
McAndrew, C.C.1
Victory, J.J.2
-
34
-
-
4344683399
-
Physics-Based mathematical conditioning of the MOSFET surface potential equation
-
W. Wu, T. Chen, G. Gildenblat, and C C. McAndrew, "Physics-Based mathematical conditioning of the MOSFET surface potential equation," IEEE Trans. Elec. Dev., vol. 51, 2004.
-
(2004)
IEEE Trans. Elec. Dev
, vol.51
-
-
Wu, W.1
Chen, T.2
Gildenblat, G.3
McAndrew, C.C.4
-
36
-
-
0021605304
-
Correlating the radiation response of MOS capacitors and transistors
-
P. S. Winokur, J. R. Schwank, P. J. McWhorter, P. V. Dressendorfer, and D. C. Turpin, "Correlating the radiation response of MOS capacitors and transistors," IEEE Trans. Nucl. Sci., vol. 31, pp. 1453-1460, 1984.
-
(1984)
IEEE Trans. Nucl. Sci
, vol.31
, pp. 1453-1460
-
-
Winokur, P.S.1
Schwank, J.R.2
McWhorter, P.J.3
Dressendorfer, P.V.4
Turpin, D.C.5
-
37
-
-
57849119071
-
Characterization of the Radiation Response of 0.13 μm n-Channel MOSFETs
-
Ponte Vedra Beach, FL
-
I. S. Esqueda, H. J. Bamaby, M. McLain, K. E. Holbert, M. Baze, J. D. Black, L. W. Massengill, B. Bhuva, R. D. Schrimpf, and F. Faceio, "Characterization of the Radiation Response of 0.13 μm n-Channel MOSFETs," in IEEE Nuclear and Space Radiation Effects Conf. Ponte Vedra Beach, FL, 2006.
-
(2006)
IEEE Nuclear and Space Radiation Effects Conf
-
-
Esqueda, I.S.1
Bamaby, H.J.2
McLain, M.3
Holbert, K.E.4
Baze, M.5
Black, J.D.6
Massengill, L.W.7
Bhuva, B.8
Schrimpf, R.D.9
Faceio, F.10
-
38
-
-
0033307562
-
A Scaleable, Radiation Hardened Shallow Trench Isolationl
-
F. T. Brady, J. D. Maimon, and M. J. Hurt, "A Scaleable, Radiation Hardened Shallow Trench Isolationl," IEEE Trans Nucl. Sci., vol. 46, pp. 1836-1840, 1999.
-
(1999)
IEEE Trans Nucl. Sci
, vol.46
, pp. 1836-1840
-
-
Brady, F.T.1
Maimon, J.D.2
Hurt, M.J.3
-
39
-
-
37249001858
-
Enhanced TID Susceptibility in sub-100 nm Bulk CMOS I/O Transistors and Circuits
-
M. McLain, H. J. Barnaby, K. E. Holbert, R. D. Schrimpf, H. Shah, A. Amort, M. Baze, and J. Wert, "Enhanced TID Susceptibility in sub-100 nm Bulk CMOS I/O Transistors and Circuits," IEEE Trans Nucl. Sci., vol. 54, pp. 2210-2217, 2007.
-
(2007)
IEEE Trans Nucl. Sci
, vol.54
, pp. 2210-2217
-
-
McLain, M.1
Barnaby, H.J.2
Holbert, K.E.3
Schrimpf, R.D.4
Shah, H.5
Amort, A.6
Baze, M.7
Wert, J.8
-
41
-
-
37249039577
-
CMOS Scaling Design Principles and Hardening-by-Design Methodologies
-
R. Lacoe, "CMOS Scaling Design Principles and Hardening-by-Design Methodologies," IEEE NSREC Short Course, 2003.
-
(2003)
IEEE NSREC Short Course
-
-
Lacoe, R.1
-
42
-
-
57849132923
-
Gate Width Effects on the Radiation Response of sub-100 nm Bulk CMOS Two-Edge Transistors
-
Colorado Springs, CO
-
M. McLain, H. J. Barnaby, K. Holbert, M. Baze, A. Amort, and J. Wert, "Gate Width Effects on the Radiation Response of sub-100 nm Bulk CMOS Two-Edge Transistors," in HEART Conference. Colorado Springs, CO, 2008.
-
(2008)
HEART Conference
-
-
McLain, M.1
Barnaby, H.J.2
Holbert, K.3
Baze, M.4
Amort, A.5
Wert, J.6
|