-
1
-
-
0021427238
-
Hole traps and trivalent silicon centers in metal/oxide/silicon devices
-
P. M. Lenahan and P. V. Dressendorfer, "Hole traps and trivalent silicon centers in metal/oxide/silicon devices," J. Appl. Phys., vol. 55, pp. 3495-3499, 1984.
-
(1984)
J. Appl. Phys.
, vol.55
, pp. 3495-3499
-
-
Lenahan, P.M.1
Dressendorfer, P.V.2
-
2
-
-
21544480403
-
Effects of oxide traps, interface traps, and border traps on metal-oxide-semiconductor devices
-
May
-
D. M. Fleetwood, P. S. Winokur Jr., R. A. Reber, T. L. Meisenheimer, J. R. Schwank, M. R. Shaneyfelt, and L. C. Riewe, "Effects of oxide traps, interface traps, and border traps on metal-oxide-semiconductor devices," J. Appl. Phys., vol. 73, no. 10, pp. 5058-5074, May 1993.
-
(1993)
J. Appl. Phys.
, vol.73
, Issue.10
, pp. 5058-5074
-
-
Fleetwood, D.M.1
Winokur P.S., Jr.2
Reber, R.A.3
Meisenheimer, T.L.4
Schwank, J.R.5
Shaneyfelt, M.R.6
Riewe, L.C.7
-
3
-
-
0032319588
-
A comprehensive physically based predictive model for radiation damage in MOS systems
-
Dec.
-
P. M. Lenahan and J. F. Conley, "A comprehensive physically based predictive model for radiation damage in MOS systems," IEEE Trans. Nucl. Sci., vol. 45, pp. 2413-2423, Dec. 1998.
-
(1998)
IEEE Trans. Nucl. Sci.
, vol.45
, pp. 2413-2423
-
-
Lenahan, P.M.1
Conley, J.F.2
-
4
-
-
0027853278
-
Molecular hydrogen E′ center hole traps, and radiation-induced interface traps in MOS devices
-
J. F. Conley Jr. and P. M. Lenahan, "Molecular hydrogen E′ center hole traps, and radiation-induced interface traps in MOS devices," IEEE Trans. Nucl. Sci., vol. 40, no. 6, pp. 1335-1340, 1993.
-
(1993)
IEEE Trans. Nucl. Sci.
, vol.40
, Issue.6
, pp. 1335-1340
-
-
Conley J.F., Jr.1
Lenahan, P.M.2
-
5
-
-
0028693950
-
Microscopic nature of border traps in MOS oxides
-
W. L. Warren, M. R. Shaneyfelt, D. M. Fleetwood, J. R. Schwank, P. S. Winokur, and R. B. Devine, "Microscopic nature of border traps in MOS oxides," IEEE Trans. Nacl. Sci., vol. 41, pp. 1817-1827, 1994.
-
(1994)
IEEE Trans. Nacl. Sci.
, vol.41
, pp. 1817-1827
-
-
Warren, W.L.1
Shaneyfelt, M.R.2
Fleetwood, D.M.3
Schwank, J.R.4
Winokur, P.S.5
Devine, R.B.6
-
8
-
-
0012601519
-
Interaction of molecular-hydrogen with trapped hole Et centers in irradiated and high-field stressed metal-oxide silicon-oxides
-
P. M. Lenahan, W. L. Warren, D. T. Krick, P. V. Dressendorfer, and B. B. Triplett, "Interaction of molecular-hydrogen with trapped hole Et centers in irradiated and high-field stressed metal-oxide silicon-oxides," J. Appl. Phys., vol. 67, no. 12, pp. 7612-7614, 1990.
-
(1990)
J. Appl. Phys.
, vol.67
, Issue.12
, pp. 7612-7614
-
-
Lenahan, P.M.1
Warren, W.L.2
Krick, D.T.3
Dressendorfer, P.V.4
Triplett, B.B.5
-
9
-
-
0033328606
-
2
-
Dec.
-
2," IEEE Trans. Nucl. Sci., vol. 46, pp. 1544-1552, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1544-1552
-
-
Karna, S.P.1
Kurtz, H.A.2
Shedd, W.M.3
Pugh, R.D.4
Singaraju, B.K.5
-
10
-
-
0031342837
-
2: A first principles quantum mechanical investigation
-
Dec.
-
2: A first principles quantum mechanical investigation," IEEE Trans. Nucl. Sci., vol. 44, p. 1799, Dec. 1997.
-
(1997)
IEEE Trans. Nucl. Sci.
, vol.44
, pp. 1799
-
-
Chavez, J.R.1
Karna, S.P.2
Pineda, A.C.3
Pugh, R.D.4
Shedd, W.M.5
Oldham, T.R.6
-
11
-
-
0032666006
-
Theoretical study using density functional theory of defects in amorphous silicon dioxide
-
A. Courtot-Descharles, P. Paillet, and J. L. Leray, "Theoretical study using density functional theory of defects in amorphous silicon dioxide," J. Non-Cryst. Solids, vol. 245, pp. 154-160, 1999.
-
(1999)
J. Non-Cryst. Solids
, vol.245
, pp. 154-160
-
-
Courtot-Descharles, A.1
Paillet, P.2
Leray, J.L.3
-
12
-
-
0034450489
-
Electronic structure theory and mechanisms of the oxide trapped hole annealing process
-
Dec.
-
S. P. Karna, A. C. Pineda, R. D. Pugh, W. M. Shedd, and T. R. Oldham, "Electronic structure theory and mechanisms of the oxide trapped hole annealing process," IEEE Trans. Nucl. Sci., vol. 47, p. 2316, Dec. 2000.
-
(2000)
IEEE Trans. Nucl. Sci.
, vol.47
, pp. 2316
-
-
Karna, S.P.1
Pineda, A.C.2
Pugh, R.D.3
Shedd, W.M.4
Oldham, T.R.5
-
14
-
-
0033307439
-
2: Implications for transport
-
Dec.
-
2: Implications for transport," IEEE Trans. Nucl. Sci., vol. 46, pp. 1568-1573, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1568-1573
-
-
Bunson, P.E.1
Ventra, M.D.2
Pantelides, S.T.3
Schrimpf, R.D.4
Galloway, K.F.5
-
15
-
-
0026838592
-
Paramagnetic point defects in amorphous silicon dioxide and amorphous silicon nitride thin films
-
Mar.
-
W. L. Warren, J. Kanicki, F. C. Rong, and E. H. Poindexter, "Paramagnetic point defects in amorphous silicon dioxide and amorphous silicon nitride thin films," J. Electrochem. Soc., vol. 139, no. 3, pp. 880-889, Mar. 1992.
-
(1992)
J. Electrochem. Soc.
, vol.139
, Issue.3
, pp. 880-889
-
-
Warren, W.L.1
Kanicki, J.2
Rong, F.C.3
Poindexter, E.H.4
-
16
-
-
4243434794
-
Fundamental radiation-induced defect centers in synthetic fused silicas: Atomic chlorine, delocalized E′ centers and triplet state
-
D. L. Griscom and E. J. Friebele, "Fundamental radiation-induced defect centers in synthetic fused silicas: Atomic chlorine, delocalized E′ centers and triplet state," Phys. Rev. B, vol. 34, pp. 7524-7533, 1986.
-
(1986)
Phys. Rev. B
, vol.34
, pp. 7524-7533
-
-
Griscom, D.L.1
Friebele, E.J.2
-
17
-
-
0028764496
-
The many varieties of E′ centers: A review
-
R. A. Weeks, "The many varieties of E′ centers: A review," J. Non-Cryst. Solids, vol. 179, pp. 1-9, 1994.
-
(1994)
J. Non-Cryst. Solids
, vol.179
, pp. 1-9
-
-
Weeks, R.A.1
-
18
-
-
0032183115
-
Section 1. defect studies in vitreous silica and releated materials: Optically active oxygen-deficiency-related centers in amorphous silicon dioxide
-
L. Skuja, "Section 1. defect studies in vitreous silica and releated materials: Optically active oxygen-deficiency-related centers in amorphous silicon dioxide," J. Non-Cryst. Solids, vol. 239, pp. 16-48, 1998.
-
(1998)
J. Non-Cryst. Solids
, vol.239
, pp. 16-48
-
-
Skuja, L.1
-
20
-
-
10644250257
-
Inhomogeneous electron gas
-
P. Hohenberg and W. Kohn, "Inhomogeneous electron gas," Phys. Rev., vol. 136, p. B864, 1964.
-
(1964)
Phys. Rev.
, vol.136
-
-
Hohenberg, P.1
Kohn, W.2
-
21
-
-
0042113153
-
Self-consistent equation including exchange and correlation effects
-
W. Kohn and L. J. Sham, "Self-consistent equation including exchange and correlation effects," Phys. Rev., vol. 140, p. A1133, 1965.
-
(1965)
Phys. Rev.
, vol.140
-
-
Kohn, W.1
Sham, L.J.2
-
22
-
-
0001457481
-
Asymmetrical relaxation of simple E′ centers in silicon dioxide isomorphs
-
May
-
A. H. Edwards, W. B. Fowler, and F. J. Feigl, "Asymmetrical relaxation of simple E′ centers in silicon dioxide isomorphs," Phys. Rev. B, vol. 37, no. 15, pp. 9000-9005, May 1988.
-
(1988)
Phys. Rev. B
, vol.37
, Issue.15
, pp. 9000-9005
-
-
Edwards, A.H.1
Fowler, W.B.2
Feigl, F.J.3
-
24
-
-
11944249966
-
2 generated by an ab initio molecular-dynamics quench from the melt
-
2 generated by an ab initio molecular-dynamics quench from the melt," Phys. Rev. Lett., vol. 74, p. 4682, 1995.
-
(1995)
Phys. Rev. Lett.
, vol.74
, pp. 4682
-
-
Sarnthein, J.1
Pasquarello, A.2
Car, R.3
-
25
-
-
4243606416
-
2 generated by an ab initio molecular-dynamics quench from the melt
-
2 generated by an ab initio molecular-dynamics quench from the melt," Phys. Rev. B, vol. 42, p. 12 690, 1995.
-
(1995)
Phys. Rev. B
, vol.42
, pp. 12690
-
-
-
26
-
-
0000734410
-
2
-
Feb.
-
2," Phys. Rev. Lett., vol. 78, no. 5, pp. 887-890, Feb. 1997.
-
(1997)
Phys. Rev. Lett.
, vol.78
, Issue.5
, pp. 887-890
-
-
Boero, M.1
Pasquarello, A.2
Sarnthein, J.3
Car, R.4
-
27
-
-
0026222822
-
Radiation-induced neutral electron trap generation in electrically biased insulated gate field effect transistor gate insulators
-
M. Walters and A. Reisman, "Radiation-induced neutral electron trap generation in electrically biased insulated gate field effect transistor gate insulators," J. Electrochem. Soc., vol. 138, p. 2756, 1991.
-
(1991)
J. Electrochem. Soc.
, vol.138
, pp. 2756
-
-
Walters, M.1
Reisman, A.2
-
28
-
-
0024913722
-
The nature of the trapped hole annealing process
-
Dec.
-
A. J. Lelis, T. R. Oldham, H. E. Boesh Jr., and F. B. MCLean, "The nature of the trapped hole annealing process," IEEE Trans. Nucl. Sci., vol. 36, pp. 1808-1815, Dec. 1989.
-
(1989)
IEEE Trans. Nucl. Sci.
, vol.36
, pp. 1808-1815
-
-
Lelis, A.J.1
Oldham, T.R.2
Boesh H.E., Jr.3
McLean, F.B.4
-
29
-
-
0012605672
-
Theoretical and experimental aspects of the thermal dependence of electron capture coefficients
-
Aug.
-
D. Goguenheim and M. Lannoo, "Theoretical and experimental aspects of the thermal dependence of electron capture coefficients," J. Appl. Phys., vol. 68, no. 3, pp. 1059-1069, Aug. 1990.
-
(1990)
J. Appl. Phys.
, vol.68
, Issue.3
, pp. 1059-1069
-
-
Goguenheim, D.1
Lannoo, M.2
-
30
-
-
24444443385
-
2 interface
-
July
-
2 interface," Phys. Rev. B, vol. 44, no. 4, pp. 1724-1733, July 1991.
-
(1991)
Phys. Rev. B
, vol.44
, Issue.4
, pp. 1724-1733
-
-
-
31
-
-
0028547704
-
1/f noise and radiation effects in MOS devices
-
D. M. Fleetwood, T. L. Mesisenheimer, and J. H. Scofield, "1/f noise and radiation effects in MOS devices," IEEE Trans. Electron Devices, vol. 41, no. 11, pp. 1953-1964, 1994.
-
(1994)
IEEE Trans. Electron Devices
, vol.41
, Issue.11
, pp. 1953-1964
-
-
Fleetwood, D.M.1
Mesisenheimer, T.L.2
Scofield, J.H.3
-
32
-
-
0024169251
-
Reversibility of trapped hole annealing
-
Dec.
-
A. J. Lelis, H. E. Boesch Jr., T. R. Oldham, and F. B. MCLean, "Reversibility of trapped hole annealing," IEEE Trans. Nucl. Sci., vol. 35, pp. 1186-1191, Dec. 1988.
-
(1988)
IEEE Trans. Nucl. Sci.
, vol.35
, pp. 1186-1191
-
-
Lelis, A.J.1
Boesch H.E., Jr.2
Oldham, T.R.3
McLean, F.B.4
-
33
-
-
0021587257
-
Physical mechanisms contributing to device 'Rebound'
-
Dec.
-
J. R. Schwank, P. S. Winokur, P. J. MCWhorter, F. W. Sexton, P. V. Dressendorfer, and D. C. Turpin, "Physical mechanisms contributing to device 'Rebound'," IEEE Trans. Nucl. Sci., vol. NS-31, pp. 1434-1438, Dec. 1984.
-
(1984)
IEEE Trans. Nucl. Sci.
, vol.NS-31
, pp. 1434-1438
-
-
Schwank, J.R.1
Winokur, P.S.2
McWhorter, P.J.3
Sexton, F.W.4
Dressendorfer, P.V.5
Turpin, D.C.6
-
34
-
-
0027797897
-
The role of border traps in MOS high-temperature postirradiation annealing response
-
D. M. Fleetwood, M. R. Shaneyfelt, L. C. Riewe, P. S. Winokur, and R. A. Reber, "The role of border traps in MOS high-temperature postirradiation annealing response," IEEE Trans. Nucl. Sci., vol. 40, no. 6, pp. 1323-1334, 1993.
-
(1993)
IEEE Trans. Nucl. Sci.
, vol.40
, Issue.6
, pp. 1323-1334
-
-
Fleetwood, D.M.1
Shaneyfelt, M.R.2
Riewe, L.C.3
Winokur, P.S.4
Reber, R.A.5
-
35
-
-
0029491546
-
Effects of interface traps and border traps on MOS postirradiation annealing response
-
D. M. Fleetwood, W. L. Warren, J. R. Schwank, P. S. Winokur, M. R. Shaneyfelt, and L. C. Riewe, "Effects of interface traps and border traps on MOS postirradiation annealing response," IEEE Trans. Nucl. Sci., vol. 42, pp. 1698-1707, 1995.
-
(1995)
IEEE Trans. Nucl. Sci.
, vol.42
, pp. 1698-1707
-
-
Fleetwood, D.M.1
Warren, W.L.2
Schwank, J.R.3
Winokur, P.S.4
Shaneyfelt, M.R.5
Riewe, L.C.6
|