Feasibility study on high-sensitivity chemically amplified resist by polymer absorption enhancement in extreme ultraviolet lithography

Applied Physics Express

Volumn 1, Issue 6, 2008, Pages 0670121-0670123

  Kozawa, Takahiro ^a   Okamoto, Kazumasa ^a   Nakamura, Jun ^a   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ELECTRON BEAM LITHOGRAPHY; LASER PULSES; PHOTORESISTORS; PLANNING; POLYMERS; RESOURCE ALLOCATION; STRATEGIC PLANNING; ULTRAVIOLET DEVICES; WALL FLOW;

AB SORPTION COEFFICIENTS; BACKBONE POLYMERS; CHEMICALLY AMPLIFIED RESISTS; EXTREME ULTRAVIOLETS; FEASIBILITY STUDIES; HIGHLY SENSITIVES; HYDROXYSTYRENE; PHOTOABSORPTION; POLYMER ABSORPTIONS; RESIST PROCESSES; RESIST THICKNESSES; SECONDARY ELECTRONS; SENSITIZATION MECHANISMS; SIDE WALLS; SIMULATION BASED;

PHOTORESISTS;

EID: 57649094153     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.067012     Document Type: Article

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