Reflectivity degradation of grazing-incident EUV mirrors by EUV exposure and carbon contamination

Microelectronic Engineering

Volumn 86, Issue 1, 2009, Pages 99-105

  Shin, H ^a   Sporre, J R ^a   Raju, R ^a   Ruzic, D N ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Carbon contamination; EUV mirrors; Photoelectron; Reflectivity; Sputtering

Indexed keywords

CARBON FILMS; CONTAMINATION; DEBRIS; DEGRADATION; ELECTROLYSIS; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; MIRRORS; REFLECTION; SPUTTERING; SURFACE ANALYSIS; SURFACE ROUGHNESS;

ANALYTICAL MODELS; CARBON CONTAMINATION; CARBON CONTAMINATIONS; CARBON LAYERS; CONTAMINATION GROWTHS; EUV MIRRORS; EUV SOURCES; EXPOSURE TIMES; EXTREME ULTRAVIOLETS; MEASURED VALUES; MIRROR MODELS; MIRROR REFLECTIVITIES; MIRROR SURFACES; REFLECTIVITY; REFLECTIVITY DATUMS; SAMPLE SURFACES; SIMULATION RESULTS; SPUTTERING YIELDS;

ULTRAVIOLET DEVICES;

EID: 57049182429     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.10.009     Document Type: Article

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