EUV optics contamination studies in presence of selected hydrocarbons

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Garg, R ^a   Wuest A ^b   Gullikson, E ^c   Bajt, S ^d   Denbeaux, G ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d DESY   (Germany)

Author keywords

Euv; Optics contamination; Outgassing; Reflectivity; Ruthenium; X ray photoelectron spectroscopy (XPS)

Indexed keywords

CARBON CONTAMINATION; EUV; EUV MIRRORS; EUV OPTICS; EUV RADIATION; HYDROCARBON SPECIES; MO/SI MULTILAYER; TERT BUTANOL; VACUUM CHAMBERS; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

BENZENE; DEGASSING; EXTREME ULTRAVIOLET LITHOGRAPHY; HYDROCARBONS; OPTICS; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTS; REFLECTION; RUTHENIUM; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTAMINATION;

EID: 57049183757     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772770     Document Type: Conference Paper

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