Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography

Microelectronic Engineering

Volumn 83, Issue 3, 2006, Pages 476-484

  Thompson, Keith C ^a   Antonsen, Erik L ^a   Hendricks, Matthew R ^a   Jurczyk, Brian E ^a   Williams, M ^a   Ruzic, D N ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Debris mitigation; Extreme ultraviolet; Microlithography; Plasma; z Pinch

Indexed keywords

ELECTRIC DISCHARGES; IONS; LITHOGRAPHY; PHOTODIODES; ULTRAVIOLET RADIATION; XENON;

DEBRIS MITIGATION; EXTREME ULTRAVIOLET; PLASMA; Z-PINCH;

PLASMAS;

EID: 33244496207     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.11.012     Document Type: Article

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