Debris mitigation and cleaning strategies for Sn-based sources for EUV lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 943-951

  Klunder, D J W ^a   Van Herpen, M M J W ^a   Banine, V Y ^b   Gielissen, K ^c  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b ASML   (Netherlands)

^c EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Cleaning strategies; Debris mitigation; EUV lithography; Extreme UV (EUV); Sn based sources

Indexed keywords

DEBRIS; HYDROGEN; OPTICS; ULTRAVIOLET RADIATION;

CLEANING STRATEGIES; DEBRIS MITIGATION; EUV LITHOGRAPHY; EXTREME UV (EUV); SN-BASED SOURCES;

LITHOGRAPHY;

EID: 24644516600     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.619568     Document Type: Conference Paper

References (5)

1. For details about the ASML alpha tool: H. Meiling, H. Meijer, P. Kuerz, and N. Harned, "Development of the ASML alpha demo tool", this conference, paper [5751-07].
2. For details about the Sn-source of Philips Extreme UV: J. Pankert, "Status of Philips' extreme UV light source", this conference, paper [5751-27].
3. K.Koshelev, EUV source workshop 2003, 2003.
4. T.G. Pearson, P.L. Robinson, E.M. Stoddart, "The behavior of metals, particularly lead and bismuth, in Atomic Hydrogen, and attempts to prepare Atomic Hydrogen from Hydrides", Proc. Roy. Soc. London serie A, vol. 142, pp. 275-285, 1933.
5. E. Wyberg, and E. Amberger, "Hydrides of elements of main groups I-IV", Elsevier, Amsterdam, Chapter 9, 1971.