Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 3, 2008, Pages 389-398

  Shin, H ^a   Srivastava, S N ^a   Ruzic, D N ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FUEL MATERIALS; GAS DISCHARGE PRODUCED PLASMA (GDPP); ULTRAVIOLET COLLECTOR OPTICS;

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CONVERSION EFFICIENCY; ETCHING; INDUCTIVELY COUPLED PLASMA; LITHOGRAPHY; OPTICS;

TIN COMPOUNDS;

EID: 42949096048     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2899332     Document Type: Article

References (19)