Contamination evaluation system for extreme ultraviolet mirrors with the use of undulator radiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5552-5555

  Niibe, Masahito ^a   Kakutani, Yukinobu ^a   Kakiuchi, Kazuya ^a,c   Terashima, Shigeru ^b   Takase, Hiromitu ^b   Gomei, Yoshio ^b   Aoki, Takashi ^b   Matsunari, Shuichi ^b   Kondo, Hiroyuki ^b   Fukuda, Yasuaki ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b Extreme Ultra Violet Lithography System Development Association   (Japan)

^c Shinko Techno Engineering Co Ltd   (Japan)

Author keywords

Contamination; EUVL; Lifetime; Mirror; Mo Si; Multilayer

Indexed keywords

CARBON; IMPURITIES; MULTILAYERS; SILICON; ULTRAVIOLET RADIATION;

EUVL; LIFETIME; MO/SI;

MIRRORS;

EID: 31844450089     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5552     Document Type: Article

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