Effect of xenon bombardment on ruthenium-coated grazing incidence collector mirror lifetime for extreme ultraviolet lithography

Journal of Applied Physics

Volumn 100, Issue 5, 2006, Pages

  Nieto, Martin ^a   Allain, Jean Paul ^a   Titov, Vladimir ^a   Hendricks, Matthew R ^a   Hassanein, Ahmed ^a   Rokusek, Daniel ^a,d   Chrobak, Christopher ^a,e   Tarrio, Charles ^b   Barad, Yaniv ^b   Grantham, Steven ^b   Lucatorto, Thomas B ^b   Rice, Brian ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c INTEL CORPORATION   (United States)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^e UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SCALE; EXTREME ULTRAVIOLET (EUV) REFLECTIVITY; SPUTTER YIELD; XENON ION BOMBARDMENT;

ION BOMBARDMENT; LASER PRODUCED PLASMAS; LITHOGRAPHY; MIRRORS; REFLECTION; RUTHENIUM;

XENON;

EID: 33748847695     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2337106     Document Type: Article

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