Use of gas-phase ethanol to mitigate extreme UV/water oxidation of extreme UV optics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 425-432

  Klebanoff, L E ^a   Malinowski, M E ^a   Clift, W M ^a   Steinhaus, C ^a   Grunow, P ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-INDUCED DISSOCIATION; WATER OXIDATION;

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; CONTAMINATION; DISSOCIATION; LIGHT REFLECTION; MULTILAYERS; OXIDATION; PARTIAL PRESSURE; REACTION KINETICS; SPUTTERING; SURFACE PHENOMENA; ULTRAVIOLET RADIATION; WATER;

ETHANOL;

EID: 1842503864     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1649344     Document Type: Article

References (13)

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