Design of low-temperature CMOS-process compatible membrane fabricated with sacrificial aluminum layer for thermally isolated applications

Sensors and Actuators, A: Physical

Volumn 134, Issue 2, 2007, Pages 660-667

  Chang, Kow Ming ^a   Lin, Ren Jie ^a   Deng, I Chung ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b TECHNOLOGY AND SCIENCE INSTITUTE OF NORTHERN TAIWAN   (Taiwan)

Author keywords

Anchor profile; Residual stress; Sacrificial layer; Sticking effect; Surface micromachining

Indexed keywords

ALUMINUM; BOLOMETERS; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; MICROSTRUCTURE; RESIDUAL STRESSES; SURFACE MICROMACHINING;

ANCHOR PROFILE; SACRIFICIAL LAYERS; STICKING EFFECTS;

SURFACE TREATMENT;

EID: 33847379735     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.02.053     Document Type: Article

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