Formation of SiH3 radicals and nanoparticles in SiH 4-H2 plasmas observed by time-resolved cavity ringdown spectroscopy

Japanese Journal of Applied Physics

Volumn 47, Issue 9 PART 1, 2008, Pages 7032-7043

  Nagai, Takehiko ^a   Smets, Arno H M ^a   Kondo, Michio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

c Si:H; Cavity ringdown; Dust; Nanoparticle; Silyl radical

Indexed keywords

ABSORPTION; ELECTRODES; ELECTROLYSIS; HYDROGEN; LIGHT ABSORPTION; MICROCRYSTALLINE SILICON; MICROSCOPIC EXAMINATION; NANOPARTICLES; NANOSTRUCTURES; PLASMAS; PULSED LASER APPLICATIONS; SILANES; SILICON; SIZE DISTRIBUTION; DUST; SCANNING ELECTRON MICROSCOPY;

CAVITY LOSSES; CAVITY RING DOWN SPECTROSCOPIES; CAVITY RINGDOWN; ELECTRODE TEMPERATURES; GROWTH CONDITIONS; HYDROGENATED MICROCRYSTALLINE SILICONS; LIGHT LOSSES; NANOPARTICLE DENSITIES; NANOPARTICLE GROWTHS; NANOPARTICLE SIZE DISTRIBUTIONS; PROBE LASER PULSES; RADICAL DENSITIES; RAYLEIGH; SCATTERING AND ABSORPTIONS; SILYL RADICAL; SPATIAL DISTRIBUTION OF; TIME EVOLUTIONS; TIME-RESOLVED; UV SPECTRAL RANGES; VERY HIGH FREQUENCIES; CAVITY LOSS; CAVITY RING-DOWN SPECTROSCOPIES; LIGHT LOSS; MIE REGIMES; NANOPARTICLE; PROBE LASER PULSE; SEM; SPATIAL DISTRIBUTIONS;

NANOSTRUCTURED MATERIALS; NANOPARTICLES;

EID: 55149110326     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.7032     Document Type: Article

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