Study of spatial distribution of SiH3 radicals in very high frequency plasma using cavity ringdown spectroscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8095-8098

  Nagai, Takehiko ^a   Smets, Amo H M ^a   Kondo, Michio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

C Si:H; Cavity ringdown; SiH3 radical

Indexed keywords

ELECTRODES; LIGHT ABSORPTION; LIGHT SCATTERING; SPECTROSCOPIC ANALYSIS;

CAVITY LOSS; CAVITY RINGDOWN;

FREE RADICALS;

EID: 34547862816     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8095     Document Type: Article

References (13)

1. R. M. Roth, K. G. Spears and G. Wong: Appl. Phys. Lett. 45 (1984) 28.
2. Y. Takubo, Y. Takasugi and M. Yamamoto: J. Appl. Phys. 64 (1988) 1050.
3. Y. Matsumi, T. Hayashi, H. Yoshikawa and S. Komiya: J. Vac. Sci. Technol. A 4 (1986) 1786.
4. D. Mataras, S. Cavadias and D. Rapakoulias: J. Appl. Phys. 66 (1989) 119.
5. N. Itabashi, N. Nishiwaki, M. Magane, S. Naito, T. Goto, A. Matsuda, C. Yamada and E. Hirota: Jpn. J. Appl. Phys. 29 (1990) L505.
6. J. P. M. Hoefnagels, Y. Barrell, W. M. M. Kessels and M. C. M. van de Sanden: J. Appl. Phys. 96 (2004) 4094.
7. J. P. M. Hoefnagels, A. A. E. Stevens, M. G. H. Boogaarts, W. M. M. Kessels and M. C. M. van de Sanden: Chem. Phys. Lett. 360 (2002) 189.
8. A. Matsuda: J. Vac. Sci. Technol. A 16 (1998) 365.
9. P. D. Lightfoot, R. Becerra, A. A. Jemi-Alade and R. Lesclaux: Chem. Phys. Lett. 180 (1991) 441.
10. H. Águas, L. Raniero, L. Pereira, E. Fortunato and R. Martins: Thin Solid Films 451-452 (2004) 264.
11. N. Itabashi, K. Kato, N. Nishiwaki, T. Goto, C. Yamada and E. Hirota: Jpn. J. Appl. Phys. 28 (1989) L325.
12. A. Matsuda, K. Nomoto, Y. Takeuchi, A. Suzuki, A. Yuuki and J. Perrin: Surf. Sci. 227 (1990) 50.
13. A. Matsuda and T. Goto: Mater. Res. Soc. Symp. Proc. 164 (1990) 3.