Particle growth in silane-hydrogen discharges

Journal of Applied Physics

Volumn 99, Issue 3, 2006, Pages

  Kujundzic, Damir ^a   Gallagher, Alan ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PARTICLE DENSITY; PARTICLE GROWTH;

CHEMICAL REACTORS; DIFFUSION; ELECTRIC POTENTIAL; HYDROGEN; PARTICLE SIZE ANALYSIS; SILANES;

HIGH ENERGY PHYSICS;

EID: 33645513229     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2168230     Document Type: Article

References (12)

1. Sol. Energy Mater. Sol. Cells 78 (2003), special issue on thin-film silicon photovoltaics.
2. Research reports are available at http://www.nrel.gov/ncpv/thin_film/
3. Dusty plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, edited by, A. Bouchoule, (Wiley, New York, 1999).
4. M. A. Childs and A. Gallagher, J. Appl. Phys. 87, 1076 (2000);
5. M. A. Childs and A. Gallagher, J. Appl. Phys. 87, 1086 (2000).
6. A. Gallagher, G. Bano, and K. Rozsa, Sol. Energy Mater. Sol. Cells 78, 27 (2003).
7. G. Bano, K. Rozsa, and A. Gallagher, AIP Conf. Proc. 649, 152 (2002).
8. U. Bhabdarkar, U. Kortshagen, and S. L. Girshick, J. Appl. Phys. 36, 1399 (2003).
9. G. Bano, P. Horvath, K. Rozsa, and A. Gallagher, J. Appl. Phys. 98, 013304 (2005).
10. A. Gallagher, Phys. Rev. E 62, 2690 (2000).
11. D. M. Tanenbaum, A. L. Laracuente, and A. Gallagher, Appl. Phys. Lett. 68, 1705 (1996).
12. P. Horvath, K. Rozsa, and A. Gallagher, J. Appl. Phys. 96, 7660 (2004).