The role of temporal coherence in imaging with extreme ultraviolet lithography optics

Optics Communications

Volumn 219, Issue 1-6, 2003, Pages 57-63

  Naulleau, Patrick P ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Coherence; Extreme ultraviolet; Lithography; Quasimonochromatic

Indexed keywords

BANDWIDTH; COHERENT LIGHT; LIGHT REFLECTION; MULTILAYERS;

ULTRAVIOLET LITHOGRAPHY OPTICS;

PHOTOLITHOGRAPHY;

EID: 0037446550     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(03)01315-4     Document Type: Article

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