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Volumn 23, Issue 5, 2005, Pages 2003-2006

Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic

Author keywords

[No Author keywords available]

Indexed keywords

FIELD DEPENDENT ASTIGMATISM; LITHOGRAPHIC CHARACTERIZATION;

EID: 31144463852     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2037647     Document Type: Article
Times cited : (11)

References (14)
  • 7
    • 84858526223 scopus 로고    scopus 로고
    • 2nd International EUVL Workshop, San Francisco, CA, 19-20 October
    • J. Taylor, D. Sweeney, R. Hudyma, L. Hale, T. Decker, G. Kubiak, W. Sweatt, and N. Wester, 2nd International EUVL Workshop, San Francisco, CA, 19-20 October 2000 (proceedings available from SEMATECH, Austin, TX 78741, www.sematech.org).
    • (2000)
    • Taylor, J.1    Sweeney, D.2    Hudyma, R.3    Hale, L.4    Decker, T.5    Kubiak, G.6    Sweatt, W.7    Wester, N.8
  • 8
    • 84858518576 scopus 로고    scopus 로고
    • 2nd International EUVL Workshop, San Francisco, CA, 19-20 October
    • R. Hudyma, J. Taylor, D. Sweeney, L. Hale, W. Sweatt, and N. Wester, 2nd International EUVL Workshop, San Francisco, CA, 19-20 October 2000 (proceedings available from SEMATECH, Austin, TX 78741, www.sematech.org
    • (2000)
    • Hudyma, R.1    Taylor, J.2    Sweeney, D.3    Hale, L.4    Sweatt, W.5    Wester, N.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.