Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 482-493

  Erdmann, Andreas ^a   Kalus, Christian ^b   Schmöller, Thomas ^b   Wolter, Andreas ^c  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b SIGMA C GmbH   (Germany)

^c INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

EUV imaging artifacts; EUV masks; Field decomposition techniques; Lithography modeling

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; LITHOGRAPHY; MASKS; TIME DOMAIN ANALYSIS;

ELECTROMAGNETIC FIELD SIMULATION; FIELD DECOMPOSITION TECHNIQUES; LIGHT DIFFRACTION;

DIFFRACTION;

EID: 0141501326     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482744     Document Type: Conference Paper

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