Recent results from the Berkeley 0.3-NA EUV microfield exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Naulleau, Patrick P ^a   Anderson, Christopher N ^b   Dean, Kim ^c   Denham, Paul ^a   Goldberg, Kenneth A ^a   Hoef, Brian ^a   La Fontaine, Bruno ^d   Wallow, Tom ^d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c SEMATECH   (United States)

^d ADVANCED MICRO DEVICES   (United States)

Author keywords

Aberrations; Extreme ultraviolet; Illuminator; Lithography; Photoresist

Indexed keywords

ILLUMINATORS; MICROFIELD EXPOSURE TOOLS; PROGRAMMABLE FIELD SIZE;

ABERRATIONS; MASKS; OPTICAL DESIGN; PHOTORESISTS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148824081     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713440     Document Type: Conference Paper

References (21)

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20. Aerial image modeling was performed using the PROLITH modeling package from KLA-Tencor, San Jose, CA 95134.
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