Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator

Applied Optics

Volumn 45, Issue 9, 2006, Pages 1957-1963

  Naulleau, Patrick P ^a   Cain, Jason P ^b   Goldberg, Kenneth A ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTROMAGNETIC WAVE DIFFRACTION; ERROR ANALYSIS; INTERFEROMETERS; MEASUREMENT THEORY; ULTRAVIOLET RADIATION;

LITHOGRAPHIC MEASUREMENT; PROGRAMMABLE COHERENCE ILLUMINATOR; SPHERICAL ABERRATION; SPHERICAL ERROR;

LITHOGRAPHY;

EID: 33645754693     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.001957     Document Type: Article

References (15)

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