Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7354-7360

  Carta, Giovanni ^a   El Habra, N ^a,b   Rossetto, G ^a   Crociani, L ^a   Torzo, G ^a   Zanella, P ^a   Casarin, M ^b   Cavinato, G ^b   Pace, G ^a   Kaciulis, S ^c   Mezzi, A ^c  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c CNR   (Italy)

Author keywords

Cyclopentadienyl precursors; HfO2 coatings; MOCVD; Monoclinic HfO2; Polycrystalline films

Indexed keywords

ARSENIC COMPOUNDS; CHEMICAL COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; HAFNIUM; THICK FILMS; THIN FILMS; TRANSITION METAL COMPOUNDS;

CHEMICAL VAPORS; CYCLOPENTADIENYL; CYCLOPENTADIENYL PRECURSORS; HAFNIUM DIOXIDE; HFO2 COATINGS; MOCVD; MONOCLINIC HFO2; POLYCRYSTALLINE FILMS;

HAFNIUM COMPOUNDS;

EID: 49349088693     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.02.017     Document Type: Article

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