Thermal properties of volatile organohafnium precursors for HfO2 MOCVD processes

Proceedings - Electrochemical Society

Volumn PV 2005-09, Issue , 2005, Pages 260-267

  Carta, Giovanni ^a   Rossetto, G ^a   Sitran, S ^a   Zanella, P ^a   Crociani, L ^a   Zherikova, K V ^b   Morozova, N B ^b   Gelfond, N V ^b   Semyannikov, P P ^b   Yakovkina, L V ^b   Smirnova, T P ^b   Igumenov, I K ^b  

^a CNR   (Italy)

^b ENERGY SYSTEMS INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; HAFNIUM COMPOUNDS; MASS SPECTROMETRY; PYROLYSIS; SYNTHESIS (CHEMICAL); THERMOANALYSIS; THERMOGRAVIMETRIC ANALYSIS; VAPOR PRESSURE; X RAY DIFFRACTION;

FILM DEPOSITION; HAFNIUM DERIVATIVES; X RAY DIFFRACTION PATTERNS;

VOLATILE ORGANIC COMPOUNDS;

EID: 31744450803     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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