Direct liquid injection metal-organic chemical vapor deposition of HfO 2 thin films using Hf(dimethylaminoethoxide)4

Thin Solid Films

Volumn 450, Issue 2, 2004, Pages 272-275

  Song, Moon Kyun ^a   Kang, Sang Woo ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Direct liquid injection; Gate dielectric; Hafnium oxide film; Hf(dmae)4; Metal organic chemical vapor deposition

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CARBON; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; GRAIN SIZE AND SHAPE; HAFNIUM COMPOUNDS; LEAKAGE CURRENTS; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

DIRECT LIQUID INJECTION; GATE DIELECTRIC; HAFNIUM OXIDE FILMS; HF(DMAE)4;

THIN FILMS;

EID: 1242321037     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.164     Document Type: Article

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