Thermal stability studies for advanced Hafnium and Zirconium ALD precursors

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9060-9065

  Rushworth, Simon ^a   Coward, Kathleen ^a   Davies, Hywel ^a   Heys, Peter ^a   Leese, Thomas ^a   Kempster, Louis ^a   Odedra, Rajesh ^a   Song, Fuquan ^a   Williams, Paul ^a  

^a Epichem Ltd   (United Kingdom)

Author keywords

61.18.Fs; 81.70.Pg; 82.33.Ya; ALD; High K; NMR; Precursors; Stability; TGA

Indexed keywords

ATOMIC LAYER DEPOSITION; NUCLEAR MAGNETIC RESONANCE; PHYSICAL PROPERTIES; PYROLYSIS; SEMICONDUCTOR DEVICES; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; ZIRCONIUM;

METAL OXIDE LAYERS; MOLECULAR ENGINEERING;

HAFNIUM;

ATOMIC LAYER DEPOSITION; HAFNIUM; NUCLEAR MAGNETIC RESONANCE; PHYSICAL PROPERTIES; PYROLYSIS; SEMICONDUCTOR DEVICES; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; ZIRCONIUM;

EID: 34547700874     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.050     Document Type: Article

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