MOCVD growth and characterization of ZrO2 thin films obtained from unusual organo-zirconium precursors

Chemical Vapor Deposition

Volumn 5, Issue 4, 1999, Pages 159-164

  Codato, Simone ^a   Carta, Giovanni ^a   Rossetto, Gilberto ^a   Rizzi, Gian Antonio ^b   Zanella, Pierino ^a   Scardi, Paolo ^c   Leoni, Matteo ^c  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c UNIVERSITY OF TRENTO   (Italy)

Author keywords

MOCVD; Stress; Thin films; X ray diffraction; Zirconia

Indexed keywords

EID: 0001041541     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3862(199908)5:4<159::AID-CVDE159>3.0.CO;2-E     Document Type: Article

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